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US 9,754,792 B1Granted
Fin cutting process for manufacturing FinFET semiconductor devices
AssigneeGlobalfoundries Inc.
InventorGaro Jacques Derderian
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AssigneeGlobalfoundries Inc.
InventorGaro Jacques Derderian
Estimating the term…
One illustrative method disclosed herein includes, among other things, forming an original fin-formation etch mask comprised of a plurality of original line-type features and removing at least a portion of at least one of the plurality of original line-type features so as to thereby define a modified fin-formation etch mask comprising the remaining portions of the plurality of original line-type features. The method also includes forming a conformal layer of material on the remaining portions of the plurality of original line-type features of the modified fin-formation etch mask and performing at least one etching process to remove at least portions of the conformal layer of material and to define a plurality of fin-formation trenches so as to thereby initially define a plurality of fins in the substrate.
A method, comprising:
A method, comprising:
A method, comprising:
Dependencies are inferred from the claim text.
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Characterised by their size, orientation, disposition, behaviour or shape, in horizontal or vertical plane: characterised by their behaviour…
The components including insulated gates, e.g. IGFETs: the components including FinFETs
Using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology: using silicon technology, e.g. SiGe
Manufacture or treatment: comprising FinFETs
About 9 years 4 months of term left · ends 29 Feb 2036 (estimated)
1. Field of the Invention
Generally, the present disclosure relates to the manufacturing of semiconductor devices, and, more specifically, to a novel fin cutting process for manufacturing FinFET semiconductor devices.
2. Description of the Related Art
The disclosure may be understood by reference to the following description taken in conjunction with the accompanying drawings, in which like reference numerals identify like elements, and in which:
FIG. 1A is a perspective view of one illustrative embodiment of a prior art FinFET device;
FIGS. 1B-1H depict illustrative prior art methods of removing selected fin structures when forming FinFET semiconductor devices; and
While the subject matter disclosed herein is susceptible to various modifications and alternative forms, specific embodiments thereof have been shown by way of example in the drawings and are herein described in detail. It should be understood, however, that the description herein of specific embodiments is not intended to limit the invention to the particular forms disclosed, but on the contrary, the intention is to cover all modifications, equivalents, and alternatives falling within the spirit and scope of the invention as defined by the appended claims.
Various illustrative embodiments of the invention are described below. In the interest of clarity, not all features of an actual implementation are described in this specification. It will of course be appreciated that in the development of any such actual embodiment, numerous implementation-specific decisions must be made to achieve the developers' specific goals, such as compliance with system-related and business-related constraints, which will vary from one implementation to another. Moreover, it will be appreciated that such a development effort might be complex and time-consuming, but would nevertheless be a routine undertaking for those of ordinary skill in the art having the benefit of this disclosure.
The present subject matter will now be described with reference to the attached figures. Various structures, systems and devices are schematically depicted in the drawings for purposes of explanation only and so as to not obscure the present disclosure with details that are well known to those skilled in the art. Nevertheless, the attached drawings are included to describe and explain illustrative examples of the present disclosure. The words and phrases used herein should be understood and interpreted to have a meaning consistent with the understanding of those words and phrases by those skilled in the relevant art. No special definition of a term or phrase, i.e., a definition that is different from the ordinary and customary meaning as understood by those skilled in the art, is intended to be implied by consistent usage of the term or phrase herein. To the extent that a term or phrase is intended to have a special meaning, i.e., a meaning other than that understood by skilled artisans, such a special definition will be expressly set forth in the specification in a definitional manner that directly and unequivocally provides the special definition for the term or phrase.