Plasma processing apparatus
AssigneeTokyo Electron Limited
InventorNaohiko Okunishi
Life of this patent
Estimating the term…
Loading patent…
AssigneeTokyo Electron Limited
InventorNaohiko Okunishi
Estimating the term…
A resonance frequency is adjusted or optimized by shifting the resonance frequency without reducing an impedance function or a withstand voltage characteristic against a high frequency noise, when blocking, by using a multiple parallel resonance characteristic of a distributed constant line, the high frequency noise introduced into a line such as a power feed line or a signal line from an electrical member other than a high frequency electrode within a processing vessel. Regarding winding pitches, each of the solenoid coils 104(1) and 104(2) is divided to multiple sections K1, K2, . . . in a coil axis direction, and, a winding pitch pi in each section Ki (i=1, 2, . . . ) is set independently. Comb teeth M inserted into winding gaps of both solenoid coils 104(1) and 104(2) are formed on inner surfaces of multiple rod-shaped comb-teeth member 114 provided adjacent to the solenoid coils 104(1) and 104(2).
A plasma processing apparatus, including an external circuit of a power meter or a signal meter electrically connected via a line to an electrical member within a processing vessel in which a plasma process is performed, configured to reduce or block a high frequency noise of a predetermined frequency introduced from the electrical member into the line toward the external circuit by a filter provided on the line,
A plasma processing apparatus, including an external circuit of a power meter or a signal meter electrically connected via a line to an electrical member within a processing vessel in which a plasma process is performed, configured to reduce or block a high frequency noise of a predetermined frequency introduced from the electrical member into the line toward the external circuit by a filter provided on the line,
A plasma processing apparatus, including an external circuit of a power meter or a signal meter electrically connected via a line to an electrical member within a processing vessel in which a plasma process is performed, configured to reduce or block a high frequency noise of a predetermined frequency introduced from the electrical member into the line toward the external circuit by a filter provided on the line,
A plasma processing apparatus, including an external circuit of a power meter or a signal meter electrically connected via a line to an electrical member within a processing vessel in which a plasma process is performed, configured to reduce or block a high frequency noise of a predetermined frequency introduced from the electrical member into the line toward the external circuit by a filter provided on the line,
A plasma processing apparatus, including an external circuit of a power meter or a signal meter electrically connected via a line to an electrical member within a processing vessel in which a plasma process is performed, configured to reduce or block a high frequency noise of a predetermined frequency introduced from the electrical member into the line toward the external circuit by a filter provided on the line,
Dependencies are inferred from the claim text.