High-speed hotspot or defect imaging with a charged particle beam system

An inspection tool comprising:

• an electron beam generator unit configured to generate an electron beam;
• a stage configured to clamp a wafer;
• at least one actuator configured to move the stage;
• electron beam optics configured to direct the electron beam at a surface of the wafer;
• a detector configured to detect electrons from the electron beam;
• and
• a controller in electronic communication with at least the electron beam optics and the actuator, wherein the controller is configured to:
• receive instructions including at least two areas of interest in a swath of the wafer to be scanned by the electron beam;
• generate a scan pattern for the electron beam to image the areas of interest on the wafer, wherein the scan pattern minimizes dwell time of the electron beam on the surface of the wafer between the areas of interest, and wherein the controller selects at least one stage speed and at least one raster pattern based on the areas of interest in the swath;
• and
• send instructions to the electron beam optics to direct the electron beam at the areas on the surface of the wafer using the scan pattern.