Electrostatic multipole device, electrostatic multipole arrangement, and method of manufacturing an electrostatic multipole device
AssigneeICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
InventorsBenjamin John Cook, Dieter Winkler
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Abstract
An electrostatic multipole device for influencing a charged particle beam propagating along an optical axis is described. The electrostatic multipole device comprises a substrate with at least one aperture opening for the charged particle beam, which extends along the optical axis through the substrate, and four or more electrodes which are formed on a first main surface of the substrate to influence the charged particle beam propagating through the aperture opening, wherein each of the four or more electrodes is arranged at a radial distance from a beam limiting edge of the aperture opening. Further, a method of manufacturing an electrostatic multipole device is described.
Claims19
An electrostatic multipole device for influencing a charged particle beam propagating along an optical axis, comprising:
- a substrate with at least one aperture opening for the charged particle beam, which extends along the optical axis through the substrate;
- and
- four or more electrodes which are formed on a first main surface of the substrate for influencing the charged particle beam propagating through the aperture opening, wherein each of the four or more electrodes is arranged at the same distance from the optical axis and at a radial distance from a beam limiting edge of the aperture opening,
- wherein the substrate comprises at least one insulator layer, which comprises the first main surface on which the electrodes are formed.
An electrostatic multipole arrangement for individually influencing at least a first beamlet of charged particles propagating along a first optical axis and a second beamlet of charged particles propagating along a second optical axis, comprising:
- a substrate with a first aperture opening for generating the first beamlet which extends through the substrate along the first optical axis and a second aperture opening for generating the second beamlet which extends through the substrate along the second optical axis;
- four or more first beamlet electrodes which are formed on a first main surface of the substrate for influencing the first beamlet, wherein each of the four or more first beamlet electrodes is arranged at the same distance from the first optical axis and at a radial distance from a beam limiting edge of the first aperture opening,
- four or more second beamlet electrodes which are formed on the first main surface of the substrate for influencing the second beamlet, wherein each of the four or more second beamlet electrodes is arranged at the same distance from the second optical axis and at a radial distance from a beam limiting edge of the second aperture opening,
- wherein the substrate comprises at least one insulator layer, which comprises the first main surface on which the electrodes are formed.
A method of manufacturing an electrostatic multipole device for influencing a charged particle beam propagating along an optical axis, comprising:
- providing a multilayer substrate with an insulator layer and a conductor or semiconductor layer arranged on top of the insulator layer,
- forming at least one aperture opening for the charged particle beam which extends along the optical axis through the multilayer substrate,
- partially removing the conductor or semiconductor layer such that remaining portions of the conductor or semiconductor layer form four or more electrodes on a first main surface of the insulator layer for influencing the charged particle beam propagating through the aperture opening,
- wherein each of the four or more electrodes is arranged at the same distance from the optical axis and at a radial distance from a beam limiting edge of the aperture opening.
Dependencies are inferred from the claim text.