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US 9,754,755 B2Granted
Nanoparticle-templated lithographic patterning of nanoscale electronic components
AssigneeElwha LLC
InventorsMax N. Mankin, Tony S. Pan
Life of this patent
Estimating the term…
Abstract
Some embodiments of vacuum electronics call for nanoscale field-enhancing geometries. Methods and apparatus for using nanoparticles to fabricate nanoscale field-enhancing geometries are described herein. Other embodiments of vacuum electronics call for methods of controlling spacing between a control grid and an electrode on a nano- or micron-scale, and such methods are described herein.
Claims19
A method comprising:
- fabricating an array of nanoscale field emitters on a substrate;
- depositing a layer of dielectric material on the nanoscale field emitters;
- depositing a sacrificial layer on the layer of dielectric material;
- and
- depositing a grid on the sacrificial layer, wherein a distance between the nanoscale field emitters and the grid is on a sub-micron scale.
2 more elements
A method comprising:
- depositing a resist on a substrate;
- patterning the resist by removing portions of the resist in a series of regions;
- depositing a dielectric material on the substrate in the series of regions in which the resist has been removed;
- removing the resist;
- and
- depositing a grid on the dielectric material, wherein a distance between the substrate and the grid is on a sub-micron scale.
3 more elements
A method comprising:
- fabricating an array of dielectric supports on a substrate;
- and
- depositing a grid on the array of dielectric supports, wherein a distance between the substrate and the grid is on a sub-micron scale.
A method comprising:
- fabricating an array of nanoscale field emitters on a substrate, the array of nanoscale field emitters having a height;
- depositing a resist on the nanoscale field emitters and the substrate, the resist having a thickness;
- etching the resist such that the thickness of the resist is less than the height of the nanoscale field emitters;
- depositing a dielectric material on the resist and the nanoscale field emitters;
- removing the resist;
- and
- depositing a grid on the dielectric material, wherein a distance between the substrate and the grid is on a sub-micron scale.
4 more elements
A method comprising:
- depositing an array of nanoparticles on a substrate, wherein at least a portion of the nanoparticles in the array of nanoparticles are coated with a dielectric material, and wherein the array of nanoparticles is arranged on the substrate with an array of gaps between the nanoparticles;
- evaporating a conductive material on the substrate in the array of gaps to create an array of field emitters;
- etching the nanoparticles in the array to produce an inverse opal;
- and
- depositing a grid on the inverse opal, wherein a distance between the substrate and the grid is on a sub-micron scale.
2 more elements
A method comprising:
- depositing an array of nanoparticles on a substrate, wherein the array of nanoparticles is arranged on the substrate with an array of gaps between the nanoparticles;
- evaporating a conductive material on the substrate in the array of gaps to create an array of field emitters;
- evaporating a dielectric material on the array of nanoparticles and the array of field emitters;
- removing the array of nanoparticles;
- and
- depositing a grid on the array of field emitters, wherein a distance between the substrate and the grid is on a sub-micron scale.
3 more elements
Dependencies are inferred from the claim text.