# US 9,753,371 B2 · Edge bead removal apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 9,753,371 B2 - Document ID: US9753371B2 - Status: Granted - Kind: B2 - Application number: 15/369,075 - Filed: 2016-12-05 - Published: 2017-03-23 - Granted: 2017-09-05 - Earliest claimed: 2013-06-05 - Assignees: Semiconductor Manufacturing International (Shanghai) Corporation - Applicants: Semiconductor Manufacturing International (Shanghai) Corporation - Inventors: Yang Liu; Qiang Wu - Web page: https://patentgrep.com/patent/US9753371B2 ## CPC - G03F 7/42: Stripping or agents therefor - B08B 3/02: Cleaning by the force of jets or sprays - B08B 3/04: Cleaning involving contact with liquid - B08B 3/08: the liquid having chemical or dissolving effect - B08B 5/02: Cleaning by the force of jets, e.g. blowing-out cavities {(airguns or nozzles per se B05B1/005)} - F26B 21/50: Ducting arrangements from the source of air or other gases to the materials or objects being dried - H10P 70/00: Cleaning of wafers, substrates or parts of devices - H10P 70/20: {Cleaning during device manufacture} - H10P 70/54: {Cleaning of wafer edges} - H10P 72/0402: {Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence)} - H10P 72/0414: {using mainly spraying means, e.g. nozzles} - H10P 72/0424: {using mainly spraying means, e.g. nozzles} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - B08B: CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL - F26B: DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM (drying devices for combines A01D41/133; racks for drying fruit or vegetables A01F25/12; drying foodstuffs A23; drying hair A45D20/00; body-drying implements A47K10/00; drying household articles A47L; drying gases or vapours B01D; chemical or physical processes for dewatering or like separating liquids from solids B01D43/00; centrifugal apparatus B04; drying ceramics C04B33/30; drying yarns or fabrics in association with some other form of treatment D06C; drying frames for laundry without heating or positive air circulation, domestic laundry-or spin-driers, wringing or hot pressing laundry D06F; furnaces, kilns, ovens F27) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract An edge bead removal apparatus is provided. The edge bead removal apparatus includes a clamping unit configured to clamp a cylindrical reticle and cause the cylindrical reticle to incline with a pre-determined angle and to rotate around a central axis. The edge bead removal apparatus also includes an edge bead removal solvent nozzle configured to spray an edge bead removal solvent to remove edge beads on both edges of the cylindrical reticle. ## Claims ### Claim 1 An edge bead removal apparatus, comprising: a clamping unit configured to clamp a cylindrical reticle and cause the cylindrical reticle to incline with a non-zero pre-determined angle and to rotate around a central axis, the cylindrical reticle comprising a photoresist layer on a middle portion of an outer circumferential surface of the cylindrical reticle; and an edge bead removal solvent nozzle configured to spray an edge bead removal solvent to remove edge beads on two end edges of the outer circumferential surface of the cylindrical reticle, the two end edges of the outer circumferential surface oppositely located adjacent to the photoresist layer. ### Claim 2 (depends on 1) The edge bead removal apparatus according to claim 1, further including: a back rinse nozzle configured to spray the edge bead removal solvent to remove a photoresist layer on both side surfaces of the cylindrical reticle. ### Claim 3 (depends on 1) The edge bead removal apparatus according to claim 1, further including: a first gas nozzle configured to remove residue edge bead removal solvent on the end edges of the outer circumferential surface of the cylindrical reticle by spraying an inert gas; and a second gas nozzle configured to remove residue edge bead removal solvent on side surfaces of the cylindrical reticle by spraying the inert gas. ### Claim 4 (depends on 3) The edge bead removal apparatus according to claim 3, wherein: the inert gas is N2. ### Claim 5 (depends on 1) The edge bead removal apparatus according to claim 1, wherein the clamping unit further includes: a first suspending arm; and a second suspending arm. ### Claim 6 (depends on 5) The edge bead removal apparatus according to claim 5, wherein: a shaft is fixed at one end of the first suspending arm; and a first bearing and second bearing configured to install the cylindrical reticle are fixed on both ends of the shaft. ### Claim 7 (depends on 1) The edge bead removal apparatus according to claim 1, wherein the clamping unit further includes: a first driving unit configured to incline one end of the cylindrical reticle downwardly with the non-zero pre-determined angle. ### Claim 8 (depends on 1) The edge bead removal apparatus according to claim 1, wherein the clamping unit further includes: a second unit configured to drive the cylindrical reticle to rotate around the central axis. ### Claim 9 (depends on 1) The edge bead removal apparatus according to claim 1, wherein: a third driving unit is connected with the edge bead removal solvent nozzle to drive the edge bead removal solvent nozzle to move close to or away from surfaces of the end edges of the outer circumferential surface of the cylindrical reticle. ### Claim 10 (depends on 1) The edge bead removal apparatus according to claim 1, wherein: the cylindrical reticle is a hollow cylinder; and the cylindrical reticle has a middle imaging area and two non-imaging areas at both sides of the imaging area. ### Claim 11 (depends on 10) The edge bead removal apparatus according to claim 10, wherein: two non-imaging areas at both sides of the imaging area includes a first non-imaging area at a first end edge and a second non-imaging area at a second end edge, and the photoresist layer covers the first and second non-imaging areas. ### Claim 12 (depends on 1) The edge bead removal apparatus according to claim 1, wherein: the clamping unit is configured to clamp and turn the cylindrical reticle for about 180°. ### Claim 13 (depends on 1) The edge bead removal apparatus according to claim 1, wherein: the non-zero pre-determined angle is in a range of approximately 45°˜90°.