# US 9,753,365 B2 · Mask plate

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- Number: US 9,753,365 B2
- Document ID: US9753365B2
- Status: Granted
- Kind: B2
- Application number: 14/785,374
- Filed: 2015-03-10
- Published: 2016-11-24
- Granted: 2017-09-05
- Earliest claimed: 2014-11-11
- Assignees: Boe Technology Group Co., Ltd.; Chengdu Boe Optoelectronics Technology Co., Ltd.
- Applicants: Boe Technology Group Co., Ltd.; Chungdu Boe Optoelectronics Technology Co., Ltd.
- Inventors: Bing Lu
- Web page: https://patentgrep.com/patent/US9753365B2

## CPC

- G03F 1/38: Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G02F 1/133516: {Methods for their manufacture, e.g. printing, electro-deposition or photolithography}
- G02F 1/13394: {spacers regularly patterned on the cell subtrate, e.g. walls, pillars (G02F1/133377 takes precedence)}
- G03F 1/42: Alignment or registration features, e.g. alignment marks on the mask substrates
- G03F 1/50: Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
- G03F 7/20: Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00)
- G02F 1/13398: {Spacer materials; Spacer properties}
- G02F 1/136231: {for reducing the number of lithographic steps}
- G03F 7/0007: {Filters, e.g. additive colour filters; Components for display devices}
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- G02F: OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS

## Abstract

The present disclosure provides a mask plate, belongs to the field of display technology, and can maintain a uniform exposing interval, so that the exposure pattern has a uniform deformation amount and pattern size. A mask plate comprises opaque regions and transparent regions, and spacers of the same height are arranged in the opaque regions. Another mask plate comprises active regions and dummy regions, and spacers of the same height are arranged in the dummy regions. The present disclosure can be applied in a process for fabricating a color film substrate.

## Claims

### Claim 1

A mask plate, comprising opaque regions and transparent regions, wherein spacers of the same height are arranged in said opaque regions, and an edge of said spacers is spaced from an edge of said opaque regions by 3-10 μm.

### Claim 2 (depends on 1)

The mask plate of claim 1, wherein said spacers have a larger than 200 and no larger than 300 μm.

### Claim 3 (depends on 1)

The mask plate of claim 1, wherein said spacers are located at central regions of said opaque regions.

### Claim 4 (depends on 1)

The mask plate of claim 1, wherein said spacers are distributed in a continuous or discrete mode.

### Claim 5 (depends on 4)

The mask plate of claim 4, wherein said spacers are distributed in the continuous mode by a density of one spacer per 24-36 sub pixels.

### Claim 6 (depends on 1)

The mask plate of claim 1, wherein said spacers have a shape of any one of cylinder, square column, prism, and sphere.

### Claim 7 (depends on 1)

A method of exposing with a mask plate, wherein the mask plate of claim 1 is applied in the method, and the method comprises steps of:
1) arranging the mask plate over a substrate in such a manner that said spacers of the same height on said mask plate contact with said substrate;
2) exposing with said mask plate to form an exposure pattern on said substrate.

### Claim 8

A mask plate, comprising active regions and dummy regions, wherein spacers of the same height are arranged in said dummy regions, and an edge of said spacers is spaced from an edge of said dummy regions by 3-10 μm.

### Claim 9 (depends on 8)

The mask plate of claim 8, wherein said spacers have a height larger than 200 and no larger than 300 μm.

### Claim 10 (depends on 8)

The mask plate of claim 8, wherein said spacers are distributed in a continuous mode by a density of one spacer per 0.2-1 million sub pixels.

### Claim 11 (depends on 8)

A method of exposing with a mask plate, wherein the mask plate of claim 8 is applied in the method, and the method comprises steps of:
1) arranging the mask plate over a substrate in such a manner that said spacers of the same height on said mask plate contact with said substrate;
2) exposing with said mask plate to form an exposure pattern on said substrate.