# US 9,753,201 B2 · Wire grid polarizer and method of fabricating the same

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- Number: US 9,753,201 B2
- Document ID: US9753201B2
- Status: Granted
- Kind: B2
- Application number: 14/668,617
- Filed: 2015-03-25
- Published: 2016-05-12
- Granted: 2017-09-05
- Earliest claimed: 2014-11-11
- Assignees: Samsung Display Co., Ltd.
- Applicants: Samsung Display Co. Ltd.
- Inventors: Su Mi Lee; Min Hyuck Kang
- Web page: https://patentgrep.com/patent/US9753201B2

## CPC

- G02B 5/3058: {comprising electrically conductive elements, e.g. wire grids, conductive particles}
- B82Y 40/00: Manufacture or treatment of nanostructures
- G03F 7/0002: {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping}
- G03F 7/0005: {Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor}
- G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- B82Y: SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

Provided is a method of fabricating a wire grid polarizer, the method comprising an organic light-emitting display panel. According to an aspect of the present disclosure, there is provided a method comprising sequentially stacking a conductive wire pattern layer, a first neutral layer, a guide pattern layer and a second neutral layer on a substrate, forming etch-stop patterns on the second neutral layer, forming second neutral layer patterns and guide patterns by patterning the second neutral layer and the guide pattern layer using the etch-stop patterns, coating a block copolymer of two types of monomer blocks having different etch rates on the first neutral layer and the second neutral layer patterns, aligning the block copolymer, removing one type of monomer blocks from the aligned block copolymer, and patterning the conductive wire pattern layer using the remaining monomer blocks, the second neutral layer patterns, and the guide patterns.

## Claims

### Claim 1

A method of fabricating a wire grid polarizer, the method comprising:
sequentially stacking a conductive wire pattern layer, a first neutral layer, a guide pattern layer and a second neutral layer on a substrate;
forming etch-stop patterns on the second neutral layer;
forming second neutral layer patterns and guide patterns by patterning the second neutral layer and the guide pattern layer using the etch-stop patterns;
coating a block copolymer of two types of monomer blocks having different etch rates on the first neutral layer and the second neutral layer patterns;
aligning the block copolymer;
removing one type of monomer blocks from the aligned block copolymer; and
patterning the conductive wire pattern layer using the remaining monomer blocks, the second neutral layer patterns, and the guide patterns.

### Claim 2 (depends on 1)

The method of claim 1, wherein side surfaces of the guide patterns have selectivity for one of the two types of monomer blocks.

### Claim 3 (depends on 2)

The method of claim 2, wherein the selectivity is hydrophilicity or hydrophobicity.

### Claim 4 (depends on 1)

The method of claim 1, wherein the aligning of the block copolymer is performed by thermal annealing or solvent annealing.

### Claim 5 (depends on 1)

The method of claim 1, wherein the guide pattern layer comprises a polarity switchable photoresist.

### Claim 6 (depends on 5)

The method of claim 5, wherein the guide pattern layer is formed by a coating process and then a curing process.

### Claim 7

A method of fabricating a wire grid polarizer, the method comprising:
sequentially stacking a conductive wire pattern layer and a guide pattern layer on a substrate;
forming guide patterns by patterning the guide pattern layer;
forming a neutral layer on the guide patterns and the conductive wire pattern layer;
coating a block copolymer of two types of monomer blocks having different etch rates on the neutral layer;
aligning the block copolymer;
removing one type of monomer blocks of from the aligned block copolymer; and
patterning the conductive wire pattern layer using the remaining monomer blocks, the neutral layer, and the guide patterns.

### Claim 8 (depends on 7)

The method of claim 7, wherein side surfaces of the guide patterns have selectivity for one of the two types of monomer blocks.

### Claim 9 (depends on 8)

The method of claim 8, wherein the selectivity is hydrophilicity or hydrophobicity.

### Claim 10 (depends on 7)

The method of claim 7, wherein the aligning of the block copolymer is performed by thermal annealing or solvent annealing.

### Claim 11 (depends on 7)

The method of claim 7, wherein the guide pattern layer comprises a polarity switchable photoresist.

### Claim 12 (depends on 11)

The method of claim 11, wherein the guide pattern layer is formed by a coating process and then a curing process.