# US 9,752,234 B2 · Arc evaporated Me11-aMe2aZI/Mo1-b-cSicBbZII multilayer coatings

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- Number: US 9,752,234 B2
- Document ID: US9752234B2
- Status: Granted
- Kind: B2
- Application number: 15/326,065
- Filed: 2015-07-24
- Published: 2017-07-27
- Granted: 2017-09-05
- Earliest claimed: 2014-07-24
- Assignees: Oerlikon Surface Solutions AG, PfäFfikon
- Applicants: Oerlikon Surface Solutions AG, Pfaffikon
- Inventors: Helmut Riedl; Mirjam Arndt; Peter Polcik; Paul Heinz Mayrhofer
- Web page: https://patentgrep.com/patent/US9752234B2

## CPC

- C23C 28/42: {characterized by the composition of the alternating layers}
- C23C 14/0641: {Nitrides (C23C14/0617 takes precedence)}
- C23C 14/067: {Borides}
- C23C 14/325: {Electric arc evaporation}
- C23C 14/3485: {using pulsed power to the target}
- C23C 14/35: by application of a magnetic field, e.g. magnetron sputtering {(C23C14/3457 takes precedence)}
- C23C 28/042: {including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides}
- C23C 28/044: {coatings specially adapted for cutting tools or wear applications}
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)

## Abstract

A coating including a multilayer film, which includes a multi-layered structure including layers of the type I and layers of the type II. The layers of the type I are metal nitride with a chemical composition given by the formula Me11-aMe2aZI and the layers of the type II are a Mo-comprising material with chemical composition given by the formula Mo1-b-cSicBbZII or Mo1-b-cSicBb. Also described is a method for depositing the above mentioned coating.

## Claims

### Claim 1

Coating comprising a multilayer film exhibiting a multilayered structure formed by a plurality N≧2 of layers type I and type II deposited alternated one on each other, characterized in that:
the layers of type I consist of a metal nitride comprising material I having chemical composition Me11-aMe2aZI, and
the layers of type II consist of a Mo comprising material II having chemical composition
Mo1-b-cSicBbZII or Mo1-b-cSicBb,
where:
Me1 is one element selected from the groups IVB, VB, and VIIB of the periodic table of the elements excepting Mo,
Me2 is one element selected from the group IIIA of the periodic table of the elements and Si,
ZI is N or NO or NC or NCO,
ZII is one or more elements selected from N, O and C,
b and c are atomic concentration coefficients and 1−b−c>0, 0<b≦0.99, and 0<c≦0.99.

### Claim 2 (depends on 1)

Coating according to claim 1, characterized in that:
the layers of type I comprise at least mainly and mostly TiAlN or are TiAlN layers, and
the layers of type II comprise at least mainly and mostly MoSiB or are MoSiB layers.

### Claim 3 (depends on 1)

Coating according to claim 1 characterized in that the layers of the type I and II have individual thicknesses in nanometer magnitude and the bilayer period λ corresponding to the sum of the thickness of one layer of the type I and one layer of the type II deposited one on each other or the sum of the thickness of one layer of the type II and one layer of the type I deposited one on each other in the multilayer film has a value 4 and 240 nm.

### Claim 4 (depends on 3)

Coating according to claim 3 characterized in that the bilayer period λ is less than 100 nm or less than 50 nm.

### Claim 5 (depends on 1)

Coating according to claim 1 characterized in that the layers of type I have an individual thickness larger than the layers of type II.

### Claim 6 (depends on 2)

Coating according to claim 2, characterized in that:
the layers of type I are TiAlN layers having chemical composition Ti1-xAlxN, and
the layers of type II are MoSiB layers having chemical composition Mo1-y-zSiyBz, where:
the coefficients x, y and z correspond to the concentration in atomic percentage of Al in the TiAlN layers without considering the nitrogen concentration,
the coefficients y and z correspond to the concentrations in atomic percentage of Si and B in the MoSiB layers, respectively,
25≦x≦80, 1−y−z>y+z, y>0, and z>0.

### Claim 7 (depends on 6)

Coating according to claim 6, characterized in that 1−y−z>50, z<30.

### Claim 8 (depends on 6)

Coating according to claim 6, characterized in that 1−y−z<80.

### Claim 9 (depends on 1)

Method for producing a coating according to claim 1 characterized in that the layers of the type I are produced by using cathodic arc PVD techniques.

### Claim 10 (depends on 1)

Method for producing a coating according to claim 1 characterized in that the layers of the type II are produced by using sputter or HIPIMS PVD techniques.

### Claim 11 (depends on 9)

Method according to claim 9, wherein the layers of type I are produced by using cathodic arc PVD techniques and the type II are produced by using sputter or HIPIMS PVD techniques.

### Claim 12 (depends on 1)

Coating according to claim 1 wherein the multilayer structure is formed by N≧4 of the layers type I and type II.

### Claim 13 (depends on 1)

Coating according to claim 1 wherein Me1 is Ti, Me2 is Al, and ZI is N.