# US 9,752,227 B2 · Deposition method

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- Number: US 9,752,227 B2
- Document ID: US9752227B2
- Status: Granted
- Kind: B2
- Application number: 14/626,220
- Filed: 2015-02-19
- Published: 2015-12-31
- Granted: 2017-09-05
- Earliest claimed: 2014-06-25
- Assignees: Fuchita Nanotechnology Ltd.
- Applicants: Fuchita Nanotechnology Ltd.
- Inventors: Eiji Fuchita; Eiji Tokizaki; Eiichi Ozawa
- Web page: https://patentgrep.com/patent/US9752227B2

## CPC

- C23C 14/34: Sputtering
- C23C 24/04: Impact or kinetic deposition of particles
- C09D 5/00: Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced {(electrically insulating plastics, resins or waxes H01B3/30)}; Filling pastes
- C23C 24/02: by application of pressure only
- H01J 37/3411: {Constructional aspects of the reactor}
- B05D 1/007: {using an electrostatic field (B05D1/02 - B05D1/16 take precedence)}
- B05D 1/06: Applying particulate materials
- B05D 1/12: Applying particulate materials (B05D1/06, B05D1/10 take precedence)
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- C09D: COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR (cosmetics A61K; processes for applying liquids or other fluent materials to surfaces, in general, B05D; staining wood B27K5/02; glazes or vitreous enamels C03C; natural resins, French polish, drying-oils, driers, turpentine, per se, C09F; polishing compositions other than French polish, ski waxes C09G; adhesives or use of materials as adhesives C09J; materials for sealing or packing joints or covers C09K3/10; materials for stopping leaks C09K3/12; processes for the electrolytic or electrophoretic production of coatings C25D)
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)
- B05D: PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL (conveying articles or workpieces through baths of liquid B65G, e.g. B65G49/02)

## Abstract

A deposition method includes: introducing a gas into an airtight container containing electrically insulated raw material particles to generate an aerosol of the raw material particles; transferring the aerosol to a deposition chamber through a transfer tubing connected to the airtight container, the deposition chamber having a pressure maintained to be lower than that of the airtight container; injecting the aerosol from a nozzle mounted on a tip of the transfer tubing toward a target placed on the deposition chamber to cause the raw material particles to collide with the target, thereby causing the raw material particles to be positively charged; generating fine particles of the raw material particles by discharge of the charged raw material particles; and depositing the fine particles on a substrate placed on the deposition chamber.

## Claims

### Claim 1

A deposition method, comprising:
introducing a gas into an airtight container containing electrically insulated raw material particles to generate an aerosol of the raw material particles;
transferring the aerosol to a deposition chamber through a transfer tubing connected to the airtight container, the deposition chamber having a pressure maintained to be lower than that of the airtight container;
injecting the aerosol from a nozzle mounted on a tip of the transfer tubing toward a target placed in the deposition chamber to cause the raw material particles to collide with the target, thereby causing the raw material particles to be positively charged;
generating fine particles of the raw material particles by sputtering the raw material particles in a plasma generated by discharge of the charged raw material particles; and
depositing the fine particles on a substrate placed in the deposition chamber, wherein the raw material particles injected from the nozzle are deflected from a first surface of the target to the substrate.

### Claim 2 (depends on 1)

The deposition method according to claim 1, wherein
the depositing includes reciprocating the substrate in an in-plane direction of the substrate, the substrate being arranged on an axis line passing through the first surface of the target, the axis line being in parallel with the first surface of the target.

### Claim 3 (depends on 1)

The deposition method according to claim 1, wherein
as the target, a conductive material is used.

### Claim 4 (depends on 1)

The deposition method according to claim 1, wherein
as the raw material particles, alumina fine particles or aluminum nitride fine particles are used.

### Claim 5 (depends on 1)

The deposition method according to claim 1, wherein
as the gas, at least one type of gas selected from the group consisting of nitrogen, argon, and oxygen is used.