# US 9,751,332 B2 · Method for applying and exposing coating or ink compositions on substrates to radiation and the product thereof > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 9,751,332 B2 - Document ID: US9751332B2 - Status: Granted - Kind: B2 - Application number: 13/993,858 - Filed: 2011-12-13 - Published: 2014-01-02 - Granted: 2017-09-05 - Earliest claimed: 2010-12-13 - Assignees: Sun Chemical Corporation - Applicants: Yuemei Zhang; Prasad K. Adhikari - Inventors: Yuemei Zhang; Prasad K. Adhikari - Web page: https://patentgrep.com/patent/US9751332B2 ## CPC - B05D 3/0209: {Multistage baking} - B05D 3/067: {Curing or cross-linking the coating} - B05D 3/068: {using ionising radiations (gamma, X, electrons)} - B41M 7/0081: {using electromagnetic radiation or waves, e.g. ultraviolet radiation, electron beams} - B41M 7/009: {using thermal means, e.g. infrared radiation, heat} - B05D 5/10: to obtain an adhesive surface - B05D 2201/02: Polymeric substrate - B05D 2202/00: Metallic substrate - B05D: PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL (conveying articles or workpieces through baths of liquid B65G, e.g. B65G49/02) - B41M: PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING, (correction of typographical errors B41J; processes for applying transfer pictures or the like B44C1/16; fluid media for correction of typographical errors by coating C09D10/00; printing textiles D06P) ## Abstract The present invention describes a two-sided radiation exposure method including a step of applying a coating or ink composition on a surface of a nonporous substrate. The applied coating or ink composition surface of the nonporous substrate is exposed to radiation one or more times. In addition, a non-applied surface of the nonporous substrate is exposed to radiation one or more times. The two-sided radiation exposure method improves adhesion and/or curing properties of the coating or ink composition applied on the nonporous substrate. The present invention also describes a radiation exposed, nonporous substrate with a coating or ink composition applied on a surface thereof produced by the steps of the above-mentioned method. ## Claims ### Claim 1 A method for applying a coating or ink composition on a nonporous substrate comprising: applying said coating or ink composition onto a first surface of said nonporous substrate; exposing said applied first surface of said nonporous substrate to radiation one or more times; and exposing a second surface of said nonporous substrate to radiation one or more times; wherein said nonporous substrate is an unprimed or non-chemically treated substrate. ### Claim 2 (depends on 1) The method according to claim 1, wherein said applied first surface is exposed to radiation before said second surface. ### Claim 3 (depends on 1) The method according to claim 1, wherein said second surface is exposed to radiation before said applied first surface. ### Claim 4 (depends on 3) The method according to claim 3, wherein said composition has less than 2,000 ppb of extractable monomers from a surface area of 51 cm when immersed in 30 ml of a food simulant liquid after both said first and second surfaces are exposed to actinic radiation. ### Claim 5 (depends on 1) The method according to claim 1, wherein said applied first surface is subject to less aggregate exposure of radiation than said second surface. ### Claim 6 (depends on 1) The method according to claim 1, wherein said nonporous substrate is transparent or semi-transparent. ### Claim 7 (depends on 1) The method according to claim 1, wherein said nonporous substrate is selected from: polypropylene, polyethylene, polyethylene terephthalate, polyethylene terephthalate glycol, polyvinyl chloride or mixtures thereof. ### Claim 8 (depends on 1) The method according to claim 1, wherein said ink composition is an energy-curable ink. ### Claim 9 (depends on 8) The method according to claim 8, wherein said energy-curable ink comprises one or more thermoplastic acrylic inert resins. ### Claim 10 (depends on 1) The method according to claim 1, wherein greater than or equal to about 95% of said coating or ink composition adheres to said substrate after both said first and second are exposed to radiation. ### Claim 11 (depends on 10) The method according to claim 10, wherein greater than or equal to about 99% of said coating or ink composition adheres to said substrate. ### Claim 12 (depends on 11) The method according to claim 11, wherein greater than or equal to about 99.99% of said coating or ink composition adheres to said substrate. ### Claim 13 A radiation exposed, nonporous substrate with a coating or ink composition applied thereon produced by the steps: applying said composition onto a first surface of said nonporous substrate; exposing said applied first surface of said nonporous substrate to radiation one or more times; and exposing a second surface of said nonporous substrate to radiation one or more times; wherein said nonporous substrate is an unprimed or non-chemically treated substrate. ### Claim 14 (depends on 13) The radiation exposed, nonporous substrate according to claim 13, wherein said applied first surface is exposed to radiation before said second surface. ### Claim 15 (depends on 14) The radiation exposed, nonporous substrate according to claim 14, wherein said second surface is exposed to radiation before said applied first surface. ### Claim 16 (depends on 15) The radiation exposed, nonporous substrate according to claim 15, wherein said composition has less than 2,000 ppb of extractable monomers from a surface area of 51 cm when immersed in 30 ml of a food simulant liquid. ### Claim 17 (depends on 13) The radiation exposed, nonporous substrate according to claim 13, wherein said applied first surface is subject to less aggregate exposure of radiation than said second surface. ### Claim 18 (depends on 13) The radiation exposed, nonporous substrate according to claim 13, wherein said nonporous substrate is transparent or semi-transparent. ### Claim 19 (depends on 13) The radiation exposed, nonporous substrate according to claim 13, wherein said nonporous substrate is selected from: polypropylene, polyethylene, polyethylene terephthalate, polyethylene terephthalate glycol, polyvinyl chloride or mixtures thereof. ### Claim 20 (depends on 13) The radiation exposed, nonporous substrate according to claim 13, wherein said composition is an energy-curable ink. ### Claim 21 (depends on 13) The radiation exposed, nonporous substrate according to claim 13, wherein said energy-curable ink comprises one or more thermoplastic acrylic inert resins. ### Claim 22 (depends on 13) The radiation exposed, nonporous substrate according to claim 13, wherein greater than or equal to about 95% of said composition adheres to said substrate after both said first and second surfaces are exposed to radiation. ### Claim 23 (depends on 22) The radiation exposed, nonporous substrate according to claim 22, wherein greater than or equal to about 99% of said composition adheres to said substrate. ### Claim 24 (depends on 23) The radiation exposed, nonporous substrate according to claim 23, wherein greater than or equal to about 99.99% of said composition adheres to said substrate. ### Claim 25 (depends on 13) Packaging materials selected from plastic materials, food-grade materials, cosmetic materials, industrial coating materials and pharmaceutical materials comprising the radiation exposed nonporous substrate according to claim 13.