Film forming method, computer storage medium, and film forming system
AssigneeTokyo Electron Limited
InventorsSatoru Shimura, Fumiko Iwao, Kousuke Yoshihara
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Abstract
The present invention is to form an organic film on a substrate having a pattern formed on a front surface thereof and configured to: apply an organic material onto the substrate; then thermally treat the organic material to form an organic film on the substrate; and then perform ultraviolet irradiation processing on the organic film to remove a surface of the organic film down to a predetermined depth, thereby appropriately and efficiently form the organic film on the substrate.
Claims16
A film forming method of forming an organic film on a substrate having a pattern formed on a front surface thereof, the method comprising:
- a coating treatment step of applying an organic material onto the substrate;
- a thermal treatment step of then thermally treating the organic material to form an organic film on the substrate;
- and
- an ultraviolet irradiation step of then performing ultraviolet irradiation processing on the organic film to remove a surface of the organic film down until a surface of the pattern is exposed,
- wherein the coating treatment step is performed again after the coating treatment step, the thermal treatment step, and the ultraviolet irradiation step are performed.
A computer-readable storage medium storing a program running on a computer of a control unit controlling a film forming system to cause the film forming system to perform a film forming method of forming an organic film on a substrate having a pattern formed on a front surface thereof,
- the film forming method comprising:
- a coating treatment step of applying an organic material onto the substrate;
- a thermal treatment step of then thermally treating the organic material to form an organic film on the substrate;
- and
- an ultraviolet irradiation step of then performing ultraviolet irradiation processing on the organic film to remove a surface of the organic film down until a surface of the pattern is exposed,
- wherein the coating treatment step is performed again after the coating treatment step, the thermal treatment step, and the ultraviolet irradiation step are performed.
A film forming system for forming an organic film on a substrate having a pattern formed on a front surface thereof, the system comprising:
- a coating treatment unit that applies an organic material onto the substrate;
- a thermal treatment unit that thermally treats the organic material to form an organic film on the substrate;
- an ultraviolet irradiation unit that performs ultraviolet irradiation processing on the organic film;
- and
- a control unit that controls the coating treatment unit, the thermal treatment unit, and the ultraviolet irradiation unit to perform the coating treatment, the thermal treatment, and the ultraviolet irradiation processing in this order and remove a surface of the organic film down until a surface of the pattern is exposed in the ultraviolet irradiation processing,
- wherein the control unit controls the coating treatment unit, the thermal treatment unit, and the ultraviolet irradiation unit to perform the coating treatment again after performing the coating treatment, the thermal treatment, and the ultraviolet irradiation processing.
Dependencies are inferred from the claim text.