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US 9,740,174 B2Granted
Method for fabrication of a silicon-based component with at least one optical illusion pattern
AssigneeNivarox-FAR S.A.
InventorsPierre Cusin, Alex Gandelhman, Michel Musy
Life of this patent
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Abstract
The invention relates to a method for fabrication of a one-piece, silicon-based component of simple shape offering the illusion of faceting and/or chamfering for forming all or part of the exterior part of a timepiece.
Claims14
A method for fabrication of at least one silicon-based component with at least one optical illusion pattern, wherein the method comprises the following steps:
- a) forming a substrate comprising a silicon-based layer;
- b) etching at least one hole through the thickness of the silicon-based layer to form the contour of the at least one silicon-based component and blind recesses in the thickness of the silicon-based layer to form the at least one silicon-based component with a flat surface comprising the at least one optical illusion pattern making the surface appear not to be flat;
- c) releasing the at least one silicon-based component thereby formed from the substrate.
Dependencies are inferred from the claim text.