Method for forming opaque quartz glass components

A method of forming an opaque quartz glass component, the method comprising:

• (a) providing a starting preform made of quartz glass, the starting perform having a direct spectral transmission of approximately 0.1 to 1% in a wavelength range of λ=190 nm to λ=4990 nm at a wall thickness of 3 mm and a diffuse reflectance of at least 60% in a wavelength range of λ=190 nm to λ=2500 nm and a density of at least 2.15 g/cm3, at least 80% of pores of the starting preform having a maximum pore dimension of between 1 and 20 μm;
• (b) heating at least a portion of the starting preform to a predetermined temperature at which the quartz glass has a viscosity in a range of 10×102 to 10×1012 poise and a density of at least 2.10 g/cm3, at least 80% of pores of the heated preform having a maximum pore dimension of between 1 and 45 μm;
• and
• (c) deforming at least a portion of the heated preform at the predetermined temperature to change at least one of a shape and dimension(s) of the heated preform in order to form the opaque quartz glass component, the opaque quartz glass component having a direct spectral transmission of approximately 0.2 to 3% in a wavelength range of λ=190 nm to λ=4990 nm at a wall thickness of 3 mm and a diffuse reflectance of at least 60% in a wavelength range of λ=190 nm to λ=2500 nm.