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US 9,723,915 B2Granted
Brush cleaning method
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsFu-Ming Huang, Liang-Guang Chen, Han-Hsin Kuo, Chi-Ming Tsai, He Hui Peng
Life of this patent
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Abstract
A method for cleaning a brush includes inducing a static charge on a surface of a first plate, wherein the first plate comprises at least one of silicon nitride (SixNy) or silicon oxide (SiaOb), wherein a, b, x and y are integers. The method further includes rotating the brush in contact with the surface of the first plate.
Claims20
A method for cleaning a brush comprising:
- inducing a static charge on a surface of a first plate, wherein the first plate comprises at least one of silicon nitride (SixNy) or silicon oxide (SiaOb), wherein a, b, x and y are integers;
- and
- rotating the brush in contact with the surface of the first plate.
A method for cleaning a brush comprising:
- inducing a first static charge on a surface of a first plate, wherein the first plate comprises at least one of silicon nitride (SixNy) or silicon oxide (SiaOb), wherein a, b, x and y are integers;
- inducing a second static charge on a surface of a second plate, wherein the second plate comprises at least one of silicon nitride or silicon oxide;
- rotating the brush in contact with the surface of the first plate;
- and
- rotating the brush in contact with the surface of the second plate.
2 more elements
A method for cleaning a brush comprising:
- inducing a static charge on a surface of a first plate, wherein the first plate comprises silicon nitride (SixNy), wherein x and y are integers;
- and
- rotating the brush in contact with the surface of the first plate.
Dependencies are inferred from the claim text.