Resist composition and pattern forming process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsJun Hatakeyama, Koji Hasegawa
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Abstract
A resist composition is provided comprising a polymer comprising recurring units (a) having an oxazolidinedione, thioxooxazolidinone, thiazolidinedione or thioxothiazolidinone structure and recurring unit (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group. The resist composition suppresses acid diffusion, exhibits a high resolution, and forms a pattern of satisfactory profile with low edge roughness.
Claims8
A resist composition comprising as base resin a polymer comprising recurring units represented by the formula (a) and recurring units having a carboxyl group substituted with an acid labile group and/or recurring units having a phenolic hydroxyl group substituted with an acid labile group, the polymer having a weight average molecular weight of 1,000 to 500,000,
- wherein R1 is hydrogen or methyl, R2 and R3 are each independently hydrogen or a straight, branched or cyclic C1-C6 alkyl group, X1 is a single bond, a C1-C12 linking group containing an ester moiety, ether moiety or lactone ring, phenylene or naphthylene group, X2 and X3 are each independently oxygen or sulfur, and a is a positive number in the range:
- 0<a<1.0.
Dependencies are inferred from the claim text.