Dispatch control method for furnace process
AssigneePowerchip Technology Corporation
InventorsJyun-Da Wu, Shih-Tsung Hsiao, Chien-Chung Chen
Life of this patent
Estimating the term…
Abstract
A dispatch control method for a furnace process including the following steps is provided. Before a plurality of lots of wafers is loaded into a furnace, the characteristic variation value of each of the plurality of lots of wafers is calculated. The plurality of lots of wafers is ordered according to the size of the characteristic variation values. The plurality of lots of wafers is placed in the furnace in a descending order of the characteristic variation values corresponding to a plurality of locations in the furnace causing the characteristic variation values to change from smaller to larger.
Claims10
A dispatch control method for a furnace process, comprising:
- calculating a characteristic variation value of each of a plurality of lots of wafers before the plurality of lots of wafers is loaded into a furnace;
- ordering the plurality of lots of wafers according to a size of the characteristic variation values;
- and
- placing the plurality of lots of wafers in the furnace in a descending order of the characteristic variation values corresponding to a plurality of locations in the furnace causing the characteristic variation values to change from smaller to larger.
Dependencies are inferred from the claim text.