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US 9,694,339 B2Granted
Chemical synthesis device and method for manufacturing chemical synthesis device
AssigneeSeiko Epson Corporation
InventorTakashi Miyata
Life of this patent
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Abstract
A chemical synthesis device that can easily control the temperature of a fluid in a channel is provided. An embodiment of a chemical synthesis device according to the invention includes a substrate provided with a first channel in which a plurality of fluids are subjected to a chemical synthesis and a second channel for controlling a temperature of the fluids flowing through the first channel.
Claims7
A method for manufacturing a chemical synthesis device having a first channel in which a plurality of fluids are subjected to chemical synthesis, the method comprising:
- forming a pre-patterned layer and a side wall layer on a first substrate;
- forming, in the pre-patterned layer, a first through hole and a second through hole that penetrate the pre-patterned layer;
- forming a first protective film on a surface of the pre-patterned layer that remains after forming the first through hole and the second through hole and on an exposed surface of the first substrate;
- and
- attaching a surface of a second substrate provided with a second protective film on the second protective film side to a surface of the first substrate on the first protective film side,
- wherein the side wall layer is provided with a first through hole and a second through hole,
- the first through hole forms a portion of the first channel,
- at least a portion of the second through hole forms a portion of a second channel that is formed along the first channel and that is different from the first channel, and
- a medium for controlling a temperature of the fluids flowing through the first channel flows through the second channel.
6 more elements
Dependencies are inferred from the claim text.