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US 9,691,771 B2Granted
Vanadium-containing film forming compositions and vapor deposition of vanadium-containing films
AssigneeL'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude
InventorsClément Lansalot-Matras, Wontae Noh
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Abstract
Vanadium-containing film forming compositions are disclosed, along with methods of synthesizing the same, and methods of forming Vanadium-containing films on one or more substrates via vapor deposition processes using the Vanadium-containing film forming compositions.
Claims20
A Vanadium-containing film forming composition comprising a precursor having the formula
- wherein each R, R1, R2, R3, R4, R5, R6, and R7 are independently H, an alkyl group, or R′3Si, with each R′ independently being H or an alkyl group.
Dependencies are inferred from the claim text.