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US 9,670,012 B2Granted
Gas-particle processor
OwnerOwen Potterinventor
Life of this patent
Estimating the term…
Abstract
A gas-particle processing method comprising: introducing gas into a chamber through a gas inlet; flowing the gas through the chamber from the gas inlet to the gas outlet at a first controlled mass flowrate; introducing at least one particle stream into the chamber through one or more particle inlets of the chamber at a second controlled mass flowrate; flowing each particle stream through a respective processing region in the chamber; and controlling the first and/or second mass flowrates, such that the gas-particle mixture porosity in a substantial portion of each processing region is 0.900-0.995.
Claims21
A gas-particle processing method comprising:
- introducing gas into a chamber through a gas inlet;
- flowing the gas through the chamber from the gas inlet to a gas outlet at a first controlled mass flowrate;
- and
- introducing at least one particle stream into the chamber through one or more particle inlets of the chamber at a second controlled mass flowrate;
- flowing each particle stream through a respective processing region in the chamber;
- and
- controlling the first and/or second controlled mass flowrates such that a gas-particle mixture porosity in a substantial portion of each processing region is 0.900-0.995.
4 more elements
Dependencies are inferred from the claim text.