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US 9,613,801 B2Granted
Integration of absorption based heating bake methods into a photolithography track system
AssigneeTokyo Electron Limited
InventorsMichael A. Carcasi, Mark H. Somervell, Benjamen M. Rathsack
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Abstract
A method of patterning a layered substrate is provided that includes forming a layer of a block copolymer on a substrate, annealing the layer of the block copolymer to affect microphase segregation such that self-assembled domains are formed, and annealing the layer of the block copolymer a second time to refine or modify the microphase segregation, where one of the annealing steps uses an absorption based heating method.
Claims18
A method of patterning a layered substrate, comprising:
- a) forming a layer of a block copolymer;
- b) performing an annealing treatment of the layer of the block copolymer to affect microphase segregation such that self-assembled domains are formed;
- and
- c) thereafter, annealing the layer of the block copolymer to refine or modify the microphase segregation to correct one or more defects in the self-assembled domains,
- wherein at least the annealing (c) is an absorption based heating method that comprises exposing at least a portion of the layer of the block copolymer to electromagnetic radiation to heat the exposed portion of the layer of the block copolymer to an annealing temperature in a range of 250° C. to 500° C.
2 more elements
Dependencies are inferred from the claim text.