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US 9,605,343 B2Granted
Method for forming conformal carbon films, structures conformal carbon film, and system of forming same
AssigneeASM IP Holding B.V.
InventorJereld Lee Winkler
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Abstract
Methods of forming carbon films, structures and devices including the carbon films, and systems for forming the carbon films are disclosed. A method includes depositing a metal carbide film using atomic layer deposition (ALD). Metal from the metal carbide film is removed from the metal carbide film to form a carbon film. Because the films are formed using ALD, the films can be relatively conformal and can have relatively uniform thickness over the surface of a substrate.
Claims20
A method of forming a carbon film, the method comprising the steps of:
- providing a substrate;
- depositing, using atomic layer deposition (ALD), a first layer of metal carbide onto the substrate;
- in a reaction chamber having a pressure in the range of about 50 mTorr to about 600 Torr and having a temperature less than 500° C., removing by etching metal from the layer of metal carbide to form a layer of carbon on the substrate,
- wherein the step of removing metal is performed after one or more ALD cycles to form the layer of carbon and the method further comprises a step of depositing, using ALD, a second layer of metal carbide over the layer of carbon.
1 more element
Dependencies are inferred from the claim text.