Apparatus for processing a melt
AssigneeVarian Semiconductor Equipment Associates, Inc.
InventorsFrederick M. Carlson, Peter L. Kellerman, David Morrell, Brian Mackintosh, Nandish Desai
Life of this patent
Estimating the term…
Abstract
An apparatus for processing a melt may include a crucible configured to contain the melt, where the melt has an exposed surface that is separated from a floor of the crucible by a first distance. The apparatus may further include a submerged heater comprising a heating element and a shell disposed between the heating element and the melt, wherein the heating element does not contact the melt. The heating element may be disposed at a second distance with respect to the exposed surface of the melt that is less than the first distance.
Claims19
An apparatus for processing a melt, comprising:
- a crucible configured to contain the melt, the melt having an exposed surface that is separated from a floor of the crucible by a first distance;
- a crucible heater disposed below the floor of the crucible and configured to deliver a heat flow to maintain the melt at or above a melting temperature of the melt;
- and
- a submerged heater comprising a heating element and a shell disposed between the heating element and the melt, wherein the heating element does not contact the melt,
- the heating element being disposed at a second distance with respect to the exposed surface of the melt that is less than the first distance, wherein the submerged heater is disposed above the crucible heater.
A system for controlling heat flow within a melt, comprising:
- a crucible configured to contain the melt, the melt having an exposed surface that is separated from a floor of the crucible by a first distance;
- a submerged heater configured to contact the melt, the submerged heater comprising a heating element and a shell that is disposed between the heating element and the melt, wherein the melt does not contact the heating element,
- the heating element being disposed at a second distance with respect to the melt that is less than the first distance, wherein the submerged heater is configured to deliver heat to a region of the exposed surface at a first heat flow rate;
- a crucible heater disposed below the floor of the crucible and configured to deliver a third heat flow to maintain the melt at or above a melting temperature of the melt, wherein the submerged heater is disposed above the crucible heater;
- and
- a crystallizer configured to remove heat from the region of the exposed surface at a second heat flow rate greater than the first heat flow rate.
A method to process a melt comprising
- arranging the melt in a crucible;
- the melt having an exposed surface and lower surface that is in contact with a floor of the crucible, the exposed surface being separated from the lower surface by a first distance;
- directing a first heat flow from a crucible heater disposed below the crucible to the exposed surface;
- and
- directing a heat flow from a heating element of a submerged heater into a region of the exposed surface of the melt when the heating element is disposed at a second distance from the exposed surface that is less than the first distance,
- wherein the melt does not contact the heating element, and wherein the submerged heater is disposed above the crucible heater.
Dependencies are inferred from the claim text.