Ion assisted deposition for rare-earth oxide based coatings on lids and nozzles
AssigneeApplied Materials, Inc.
InventorsJennifer Y. Sun, Biraja P. Kanungo, Vahid Firouzdor, Ying Zhang
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Abstract
A method of manufacturing an article comprises providing a lid or nozzle for an etch reactor. Ion assisted deposition (IAD) is then performed to deposit a protective layer on at least one surface of the lid or nozzle, wherein the protective layer is a plasma resistant rare earth oxide film having a thickness of less than 300 μm and an average surface roughness of 10 micro-inches or less.
Claims11
A chamber component for a processing chamber comprising:
- a ceramic body having at least one surface with a first average surface roughness of approximately 8-16 micro-inches;
- and
- a conformal protective layer on the at least one surface of the ceramic body, wherein the conformal protective layer is a plasma resistant rare earth oxide film selected from a group consisting of Y4Al2O9, Er2O3,Gd2O3, YF3, Er4Al2O9, ErAlO3, Gd4Al2O9, GdAlO3, Nd4Al2O9, NdAlO3, a first ceramic compound comprising a mixture of Y4Al2O9 and a solid-solution of Y2O3—ZrO2, and a second ceramic compound comprising a mixture of Y2O3, ZrO2, Er2O3, Gd2O3 and SiO2, the conformal protective layer having a substantially uniform thickness of less than 300 μm over the at least one surface and having a second average surface roughness of below 10 micro-inches, wherein the second average surface roughness is equal to or less than the first average surface roughness.
A plasma resistant lid or nozzle for a processing chamber comprising a ceramic body and a conformal protective layer on at least one surface of the ceramic body, the lid or nozzle having been manufactured by a process comprising:
- providing the lid or nozzle having a first average surface roughness of approximately 8-16 micro-inches;
- performing electron beam ion assisted deposition to deposit the conformal protective layer on the at least one surface of the lid or nozzle, the conformal protective layer having the first average surface roughness after deposition, wherein the conformal protective layer is a plasma resistant rare earth oxide film having a substantially uniform thickness of less than 50 μm over the at least one surface, and wherein the conformal protective layer is selected from a group consisting of Y4Al2O9, Er2O3, Gd2O3, Nd2O3, YF3, Er4Al2O9, ErAlO3, Gd4Al2O9, GdAlO3, Nd4Al2O9, NdAlO3, a first ceramic compound comprising of a mixture of Y4Al2O9 and a solid-solution of Y2O3—ZrO2, and a second ceramic compound comprising a mixture of Y2O3, ZrO2, Er2O3 , Gd2O3, and SiO2;
- and
- polishing the conformal protective layer to a second average surface roughness of below 10 micro-inches.
Dependencies are inferred from the claim text.