Shadow mask tensioning method and apparatus
AssigneeAdvantech Global, LTD
InventorBrian Arthur Bucci
Life of this patent
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Abstract
In a system and method of shadow mask tensioning, an object having second set of alignment features is positioned on a side of shadow mask having a first set of alignment features such that the object and the shadow mask can move independently of each other and the first and second sets of alignment features are not in final alignment. Tension is then applied to the shadow mask to bring the first set of alignment features into final alignment with the second set of alignment features. The alignment features of the shadow mask can include at least one deposition aperture of the shadow mask.
Claims20
A shadow mask tensioning method comprising:
- (a) positioning a shadow mask frame and an anchor frame in spaced relation defining a gap therebetween;
- (b) positioning a shadow mask having at least one first alignment feature on the shadow mask frame and the anchor frame with a portion of the shadow mask extending across the gap;
- (c) affixing the shadow mask to the anchor frame;
- (d) positioning an object including at least one second alignment feature on a side of the shadow mask opposite the anchor frame with the second alignment feature not in final alignment with the first alignment feature;
- (e) following steps (a)-(d), tensioning the shadow mask by urging the portion of the shadow mask into the gap thereby bringing the first alignment feature into alignment with the second alignment feature, wherein tensioning the shadow mask includes adjusting the tension at numerous, spaced locations of the portion of the shadow mask;
- and
- (f) following step (e), affixing the shadow mask to the shadow mask frame.
A shadow mask tensioning apparatus comprising:
- means for supporting a shadow mask that includes one or more first alignment features with a portion of the shadow mask that surrounds the one or more first alignment features in alignment with a gap;
- means for anchoring the shadow mask;
- an object including one or more second alignment features configured to be positioned on a side of the shadow mask;
- and
- means for individually urging numerous, spaced locations of the portion of the shadow mask that surrounds the one or more first alignment features into the gap thereby bringing the one or more first alignment features into alignment with the one or more second alignment features.
A shadow mask tensioning method comprising:
- (a) arranging an object having a second set of alignment features on a side of shadow mask having a first set of alignment features such that the object and the shadow mask can move independently of each other and the first and second sets of alignment features are not in final alignment;
- and
- (b) applying tension to the shadow mask to bring the first set of alignment features into final alignment with the second set of alignment features, wherein applying tension to the shadow mask includes adjusting the tension at numberous, spaced locations of the shadow mask.
Dependencies are inferred from the claim text.