Back to results
US 9,580,402 B2Granted
Salt, acid generator, photoresist composition, and method for producing photoresist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsHiromu Sakamoto, Koji Ichikawa
Life of this patent
Estimating the term…
Abstract
A salt represented by the formula (I): wherein R1 represents a C1 to C12 alkyl group in which a methylene group can be replaced by an oxygen atom or a carbonyl group; Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; A1 represents a lactone ring-containing group which has 4 to 24 carbon atoms; R2 represents an acid-labile group; and “m” represents an integer of 0 to 3.
Claims7
A salt represented by the formula (I):
- wherein
- R1 each independently represents a C1 to C12 alkyl group in which a methylene group can be replaced by an oxygen atom or a carbonyl group;
- Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group;
- A1 represents a lactone ring-containing group which has 4 to 24 carbon atoms;
- R2 represents an acid-labile group;
- and
- “m” represents an integer of 0 to 3.
4 more elements
Dependencies are inferred from the claim text.