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US 9,578,729 B2Granted
Extreme ultraviolet source with dual magnetic cusp particle catchers
AssigneePlex LLC
InventorMalcolm W. McGeoch
Life of this patent
Estimating the term…
Abstract
A laser-produced plasma extreme ultraviolet source has a buffer gas to slow ions down and thermalize them in a low-temperature plasma. The plasma is initially trapped in a mirror magnetic field configuration with a low magnetic field barrier to axial motion. Plasma overflows axially at each end of the mirror into magnetic cusps and is conducted by radial magnetic field lines to annular beam dumps disposed around the waist of each cusp.
Claims4
An extreme ultraviolet light source comprising:
- a chamber;
- a source of droplet targets;
- one or more lasers focused onto the droplets in an interaction region;
- a flowing buffer gas;
- one or more reflective collector elements to redirect extreme ultraviolet light to a point on the collector optical axis which is an exit port of the chamber;
- a pair of similar polarity field coils that generate a parallel magnetic field through the interaction region with magnetic symmetry axis perpendicular to the optical axis;
- a pair of opposed field coils outside of the first pair that generate cusps with magnetic null points on the magnetic axis;
- a pair of cylindrical beam dumps coaxial with the magnetic axis that intercept the radial outflow from the cusps, wherein waste heat and exhaust particles are able to escape from magnetic confinement at the cusp waists and are intercepted by the beam dumps.
5 more elements
Dependencies are inferred from the claim text.