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US 9,563,123 B2Granted
Photoresist composition, compound and process of producing photoresist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsTatsuro Masuyama, Shingo Fujita, Koji Ichikawa
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Abstract
A photoresist composition comprising: a resin having an acid-labile group, an acid generator, and a compound represented by formula (I): wherein R1, R2 and R3 each independently represents a C1-C24 hydrocarbon group in which a hydrogen atom can be replaced by a substituent and in which a methylene group can be replaced by an oxygen atom, a sulfur atom or a carbonyl group.
Claims5
A photoresist composition comprising:
- a resin having an acid-labile group,
- an-acid-generator, and
- a compound represented by formula (I):
- wherein R1, R2 and R3 each independently represents a C1-C24 hydrocarbon group in which a hydrogen atom can be replaced by a substituent and in which a methylene group can be replaced by an oxygen atom, a sulfur atom or a carbonyl group.
1 more element
Dependencies are inferred from the claim text.