Apparatus and system for generating extreme ultraviolet light and method of using the same
AssigneeSamsung Electronics Co., Ltd.
InventorsJin-Seok Heo, Jin-Hong Park
Life of this patent
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Abstract
Provided is an apparatus for generating extreme ultraviolet light. The apparatus includes a collector mirror unit, a gas supply unit configured to supply a processing gas to the collector mirror unit, a gas supply nozzle arranged in at least one area of the collector mirror unit and configured to supply the processing gas to a surface of the collector mirror unit, and a controller configured to adjust a shape of a spray hole of the gas supply nozzle. The shape of the spray hole may be changed according to a control operation of the controller.
Claims20
An apparatus for generating extreme ultraviolet light, the apparatus comprising:
- a collector mirror unit;
- a gas supply unit configured to supply a processing gas to the collector mirror unit;
- a gas supply nozzle arranged in at least one area of the collector mirror unit and configured to supply the processing gas to a surface of the collector mirror unit to remove contamination from the surface of the collector mirror unit;
- a sensing unit configured to measure a contamination level of the surface of the collector mirror unit;
- and
- a controller configured to adjust a shape of a spray hole of the gas supply nozzle based on a result of measuring the contamination level by the sensing unit,
- wherein the shape of the spray hole is changed according to a control operation of the controller.
An apparatus for generating extreme ultraviolet light, the apparatus comprising:
- a collector mirror unit;
- a gas supply unit configured to supply a processing gas to the collector mirror unit;
- a peripheral gas supply nozzle arranged at a peripheral area of the collector mirror unit and configured to supply the processing gas inwardly along a surface of the collector mirror unit to remove contamination from the surface of the collector mirror unit;
- a sensing unit configured to measure a contamination level of the surface of the collector mirror unit;
- and
- a controller configured to adjust a shape of a spray hole of the peripheral gas supply nozzle in response to the measured contamination level.
An apparatus for generating extreme ultraviolet light, the apparatus comprising:
- a vessel;
- a light source configured to supply a source light to an inside of the vessel;
- a droplet generation unit configured to supply a droplet to the source light which is provided to the inside of the vessel;
- a collector mirror unit arranged within the vessel and configured to collect and reflect extreme ultraviolet light which is generated by reaction between the source light and the droplet;
- a gas supply unit configured to supply processing gas to the collector mirror unit;
- a first gas supply nozzle arranged in a peripheral area of the collector mirror unit and supply the processing gas toward a center area of the collector mirror unit to remove contamination from a surface of the collector mirror unit;
- a second gas supply nozzle arranged in the center area of the collector mirror unit and configured to supply the processing gas therethrough;
- a sensing unit configured to measure a contamination level of the surface of the collector mirror unit;
- and
- a controller configured to adjust a shape of at least one of a first spray hole of the first gas supply nozzle and a second spray hole of the second gas supply nozzle, wherein the controller adjusts the shape of at least one of the first and second spray holes responsive to a result of measuring the contamination level by the sensing unit.
Dependencies are inferred from the claim text.