System and method for generation of extreme ultraviolet light

An inspection system comprising:

• an illumination sub-system including:
• a vacuum chamber;
• a rotatable, cylindrically-symmetric element having a surface at least partially coated with a plasma-forming target material and disposed within the vacuum chamber;
• one or more actuation devices configured to control at least one of an axial position or a tilt of the rotatable, cylindrically-symmetric element;
• a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material;
• a set of focusing optics configured to focus the one or more laser pulses onto a portion of the surface of the rotatable, cylindrically-symmetric element;
• a set of collection optics configured to receive EUV light emanated from the plasma generated in response to the excitation of the plasma-forming target material and further configured to direct the illumination to an intermediate focal point;
• a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element;
• a set of illuminator optics configured to direct illumination from the one or more collection optical elements to one or more specimens;
• a detector;
• and
• a set of projection optics configured to receive illumination from the surface of the one or more specimens and direct the illumination from the one or more specimens to the detector.