Manufacture method of making semiconductor optical device

A method for manufacturing semiconductor optical elements comprising:

• epitaxially growing, on a growth substrate, a semiconductor lamination including a first semiconductor layer of a first conductivity type having a first surface, a second semiconductor layer of a second conductivity type opposite to the first conductivity type having a second surface, and an active layer sandwiched between the first semiconductor layer and the second semiconductor layer, the semiconductor lamination including in-plane element areas for forming a plurality of semiconductor elements;
• forming second conductivity type side electrodes on the second surface in the respective element areas;
• forming first isolation grooves from the second surface, penetrating through the second semiconductor layer and the active layer, and entering the first semiconductor layer, the first isolation grooves defining the in-plane element areas;
• bonding a support body on the second conductivity type side electrodes;
• removing the growth substrate and exposing the first semiconductor surface;
• forming first conductivity type side electrodes on the exposed first surface in the element areas;
• separating the semiconductor lamination from the support body;
• and
• applying external force and dividing the semiconductor lamination into a plurality of element areas.