Semiconductor device
AssigneeKabushiki Kaisha Toshiba
InventorHitoshi Takahashi
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AssigneeKabushiki Kaisha Toshiba
InventorHitoshi Takahashi
Estimating the term…
A semiconductor device includes a second region of a second conductivity type above a first region of a first conductivity type. A gate electrode has a portion surrounded by the second region via a gate insulating layer. A first electrode, which is separated from the gate electrode, has a portion surrounded by the second region via a first insulating layer. A third region of a second conductivity type is between the first insulating layer and the gate insulating layer. The third region contacts the first insulating layer and has a second conductivity type carrier concentration higher than the second region. A fourth region has a portion aligned with the third region along a first direction. A fifth region of the second conductivity type contacts the gate insulating layer and is aligned with the first portion along a second direction perpendicular to the first direction.
A semiconductor device, comprising:
A semiconductor device, comprising:
Dependencies are inferred from the claim text.