Array substrate, display device and manufacturing method of the array substrate

A manufacturing method of an array substrate, comprising:

• forming a data line metal thin film that is located on an active layer and an ohmic layer and covers a substrate, so as to form source/drain metal, a metal wire and a data scan line through a patterning process;
• forming a resin passivation layer that is located on the source/drain metal, the metal wire and the data scan line and covers the substrate, and forming a second via hole, a third via hole and a fourth via hole in the resin passivation layer through a patterning process, the second via hole being in correspondence with a position where a drain electrode is to be formed, the third via hole being in correspondence with the position of the metal wire, the fourth via hole being in correspondence with a position between a source electrode and the drain electrode where a channel is to be formed;
• forming a transparent, conductive metal thin film that is located on the resin passivation layer and covers the substrate, so as to form the source electrode, the drain electrode, a fifth via hole of the ohmic layer and a first transparent electrode through a patterning process, the fifth via hole being in correspondence with the position of the fourth via hole.