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US 9,543,310 B2Granted
Semiconductor storage device having communicated air gaps between adjacent memory cells
AssigneeKabushiki Kaisha Toshiba
InventorsSatoshi Nagashima, Takehiro Kondoh
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Abstract
A semiconductor storage device according to an embodiment of the invention includes a semiconductor substrate and a plurality of memory cells on the semiconductor substrate. A first film is provided above the memory cells to form air gaps above a memory string in which the memory cells are connected in series.
Claims6
A semiconductor storage device comprising:
- a semiconductor substrate;
- a plurality of memory cells on the semiconductor substrate;
- and
- a first film above the memory cells to form air gaps above a memory string in which the memory cells are connected in series, wherein
- the air gaps are also provided between adjacent ones of the memory cells,
- the air gaps are communicated with each other between adjacent ones of the memory cells in the memory string and on the memory cells in the memory string, and
- the air gaps are closed at portions on select gate transistors on both ends of the memory string.
4 more elements
Dependencies are inferred from the claim text.