Implant masking and alignment system with rollers
AssigneeIntevac, Inc.
InventorsBabak Adibi, Vinay Prabhakar, Terry Bluck
Life of this patent
Estimating the term…
Abstract
System and method to align a substrate under a shadow mask. A substrate holder has alignment mechanism, such as rollers, that is made to abut against an alignment straight edge. The substrate is then aligned with respect to the straight edge and is chucked to the substrate holder. The substrate holder is then transported into a vacuum processing chamber, wherein it is made to abut against a mask straight edge to which the shadow mask is attached and aligned to. Since the substrate was aligned to an alignment straight edge, and since the mask is aligned to the mask straight edge that is precisely aligned to the alignment straight edge, the substrate is perfectly aligned to the mask.
Claims16
A system for aligning a substrate to a processing mask, comprising:
- a substrate holder having a holder alignment mechanism;
- a system guide configured to be engaged by the holder alignment mechanism to thereby orient the substrate holder to the system guide;
- a mask alignment mechanism attached to a processing chamber and aligned to the system guide, the mask alignment mechanism having mask attachment mechanism for attaching a processing mask in alignment to the mask alignment mechanism;
- tracks positioned below the processing mask and configured to enable the substrate holder to place substrates below the mask when the holder alignment mechanism engages the mask alignment mechanism;
- wherein the holder alignment mechanism comprises at least two rollers.
An ion implant comprising:
- an atmospheric alignment chamber comprising tracks and a holder alignment mechanism;
- a vacuum ion implant chamber comprising:
- an ion source, tracks, mask alignment mechanism aligned to the holder alignment mechanism, and mask attached to the mask alignment mechanism;
- a substrate holder configured for chucking a substrate and having engaging mechanism to orient the substrate holder while engaging the holder alignment mechanism and when engaging the mask alignment mechanism;
- wherein the holder alignment mechanism comprises a straight edge and wherein the mask alignment mechanism comprises a straight edge aligned in correspondence to the holder alignment mechanism;
- and,
- wherein the engaging mechanism comprises a plurality of wheels configured for engaging the holder alignment mechanism and the mask alignment mechanism.
A method for aligning a substrate to a shadow mask, comprising:
- placing a substrate on top of a substrate holder;
- abutting the substrate holder against an alignment straight edge and orienting the substrate to a desired orientation;
- chucking the substrate to the substrate holder at the desired orientation while the substrate holder is abutted against the alignment straight edge;
- moving the substrate holder into a vacuum chamber having a shadow mask attached to a mask straight edge;
- abutting the substrate holder against the mask straight edge in a position that places the substrate under the shadow mask;
- executing a processing step on the substrate through the mask;
- moving the substrate holder out of the vacuum chamber;
- and,
- wherein abutting the holder against an alignment strait edge comprises pressing rollers attached to the substrate holder against the alignment straight edge.
Dependencies are inferred from the claim text.