Charged-particle beam device for irradiating a charged particle beam on a sample
AssigneeHitachi High-Technologies Corporation
InventorsYasushi Ebizuka, Seiichiro Kanno, Naoya Ishigaki, Masashi Fujita
Life of this patent
Estimating the term…
Loading patent…
AssigneeHitachi High-Technologies Corporation
InventorsYasushi Ebizuka, Seiichiro Kanno, Naoya Ishigaki, Masashi Fujita
Estimating the term…
The present invention explains a charged-particle beam device for the purpose of highly accurately measuring electrostatic charge of a sample in a held state by an electrostatic chuck (105). In order to attain the object, according to the present invention, there is proposed a charged-particle beam device including an electrostatic chuck (105) for holding a sample on which a charged particle beam is irradiated and a sample chamber (102) in which the electrostatic chuck (105) is set. The charged-particle beam device includes a potential measuring device that measures potential on a side of an attraction surface for the sample of the electrostatic chuck (105) and a control device that performs potential measurement by the potential measuring device in a state in which the sample is attracted by the electrostatic chuck (105).
A charged-particle beam device including an electrostatic chuck mechanism for holding a sample and a sample chamber in which the electrostatic chuck is set, the charged-particle beam device comprising:
Dependencies are inferred from the claim text.