Reduced trace metals contamination ion source for an ion implantation system

An ion source chamber for an ion implantation system, the ion source chamber comprising:

• a housing that at least partially bounds an ionization region through which high energy electrons move from a cathode to ionize gas molecules injected into an interior of the housing;
• a liner section defining one or more interior walls of the housing interior, wherein each liner section includes an interiorly facing surface exposed to the ionization region during operation of the ion implantation system;
• a cathode shield disposed about the cathode, wherein the cathode is free of contact with the liner section and comprises an end cap;
• a repeller spaced apart from the cathode;
• a plate comprising a source aperture for discharging ions from the ion source chamber;
• wherein the cathode end cap, or the cathode shield, or an insert in the plate defining the source aperture comprise silicon carbide having a monolithic structure, wherein the silicon carbide is a non-stoichiometric sintered material of the formula SiCx, wherein x is from 1.1 to 1.45.