Lithographic apparatus and device manufacturing method involving a sensor detecting a radiation beam through liquid

A device manufacturing method comprising:

• at least partly filling a space between a projection system of a lithographic apparatus and a substrate table of the lithographic apparatus, with a liquid using a liquid supply system of the lithographic apparatus;
• projecting a patterned beam of radiation using the projection system through the liquid onto a target portion of a substrate supported by the substrate table;
• projecting a beam of radiation onto a part of a sensor system of the lithographic apparatus, an edge of the part of the sensor system at least partly covered by an edge member other than the substrate, the edge member providing a primary surface facing the projection system substantially co-planar with a primary surface of the part of the sensor system;
• and
• applying a low pressure using an orifice located underneath at least part of the edge member and defined in an upwardly facing surface, the orifice terminating an end of a low pressure exhaust passage.

A lithographic projection apparatus comprising:

• a movable table;
• a projection system adapted to project a patterned beam onto a target portion of a substrate;
• a liquid supply system configured to at least partly fill a space between the projection system and an object on the table, with a liquid;
• a sensor system part of the table, the sensor system part capable of being positioned to be illuminated by a beam of radiation;
• an edge member, other than the substrate, on the table, the edge member configured to at least partly extend along an edge of the sensor system part;
• and
• an upwardly facing low pressure exhaust orifice on the table, the exhaust orifice located underneath at least part of the edge member and the orifice terminating an end of a low pressure exhaust passage.

A lithographic projection apparatus comprising:

• a movable table;
• a projection system adapted to project a patterned beam onto a target portion of a substrate;
• a liquid supply system configured to at least partly fill a space between the projection system and an object on the table, with a liquid;
• a sensor system part capable of being positioned to be illuminated by a beam of radiation;
• an edge member configured to at least partly extend along an edge of a primary surface of the sensor system part and to provide a primary surface facing the projection system substantially co-planar with the primary surface of the sensor system part, the edge member and the primary surface of the sensor system part forming an open gap to allow the liquid therein;
• a seal of solid material other than or in addition to the table, below the primary surface of the sensor system part, configured to prevent passage of the liquid, in the gap, beyond the seal;
• and
• a low pressure exhaust port, below the primary surface of the sensor system part, continuously fluidly connected to the seal.