Back to results
US 9,541,834 B2Granted
Ionic thermal acid generators for low temperature applications
AssigneeRohm and Haas Electronic Materials LLC
InventorsGerhard Pohlers, Cong Liu, Cheng-Bai Xu, Kevin Rowell, Irvinder Kaur
Life of this patent
Estimating the term…
Abstract
New ionic thermal acid generator compounds are provided. Also provided are photoresist compositions, antireflective coating compositions, and chemical trim overcoat compositions, and methods of using the compositions.
Claims16
A method for providing a photoresist relief image, comprising:
- a) applying a coating layer of a chemically amplified photoresist composition on a substrate;
- b) exposing the photoresist layer to activating radiation and developing the exposed photoresist layer to provide a photoresist relief image;
- c) applying over the exposed photoresist composition coating layer a coating layer of a chemical trim overcoat composition comprising a thermal acid generator of formula (I);
- (A−)(BH)+ (I)
- in which
- A− is the anion of an organic or inorganic acid having a pKa of not more than 3;
- and
- (BH)+ is the monoprotonated form of a nitrogen-containing base B having a pKa between 0 and 5.0, and a boiling point less than 170° C.;
- d) heating the chemical trim overcoat composition layer;
- and
- e) developing the photoresist layer to provide a photoresist relief image.
8 more elements
A coated substrate comprising:
- a photoresist layer;
- and
- over the photoresist layer, a chemical trim overcoat layer comprising an ionic thermal acid generator of formula (I)
- (A−)(BH)+ (I)
- in which
- A− is the anion of an organic or inorganic acid having a pKa of not more than 3;
- and
- (BH)+ is the monoprotonated form of a nitrogen-containing base B having a pKa between 0 and 5.0, and a boiling point less than 170° C.
5 more elements
A coated substrate comprising:
- an antireflective composition layer comprising a thermal acid generator of formula (I):
- (A)−(BH)+ (I)
- in which A− is the anion of an organic or inorganic acid having a pKa of not more than 3;
- and (BH)+ is the monoprotonated form of a nitrogen-containing base B having a pKa between 0 and 5.0, and a boiling point less than 170° C.;
- and over the antireflective coating composition layer, a photoresist composition layer, wherein B is selected from the group consisting of:
- and substituted pyridine,
- in which Y is methyl or ethyl.
4 more elements
A thermal acid generator represented by the formula:
- (A−)(BH)+
- in which
- A− is the anion of a fluoroalkylsulfonic acid or inorganic acid having a pKa of not more than 3;
- and
- (BH)+ is the monoprotonated form of a nitrogen-containing base B having a pKa between 0 and 5.0, and a boiling point less than 170° C., and
- wherein B is selected from the group consisting of:
- in which Y is methyl or ethyl.
4 more elements
Dependencies are inferred from the claim text.