Photosensitive resin composition, protective film and element having the same

A photosensitive resin composition, comprising:

• a polysiloxane resin (A), obtained by polycondensing a silane monomer shown as Formula (I):
• Si(Y1)a(OY2)4-a (I)
• in the Formula (I), the Y1 respectively represents a hydrogen atom, an alkyl group of 1 to 10 carbons, an alkene group of 2 to 10 carbons, an aromatic group of 6 to 15 carbons, an alkyl group having an anhydride group, an alkyl group having an epoxy group or an alkoxy group having an epoxy group;
• the Y2 respectively represents a hydrogen atom, an alkyl group of 1 to 6 carbons, an acetyl group of 1 to 6 carbons or an aromatic group of 6 to 15 carbons;
• and the a represents an integer of 0 to 3;
• an alkali-soluble resin (B) copolymerized by an unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (b1), a fluorene derivative having a double-bond group (b2) and an unsaturated compound having an acid-decomposable group (b3), wherein the unsaturated compound having an acid-decomposable group (b3) has a structure of Formula (IV):
• in the Formula (IV), the X1 represents a hydrogen atom or an alkyl group of 1 to 3 carbons;
• the X2 represents a hydrogen atom, an alkyl group of 1 to 30 carbons or an aromatic group of 6 to 30 carbons, and the alkyl group represents a linear alkyl group, a branched alkyl group or a cycloalkyl group;
• the X3 represents an alkyl group of 1 to 40 carbons, a trialkyl silane group, an oxoalkyl group or a structure of Formula (IV), and the alkyl group represents a linear alkyl group, a branched alkyl group or a cycloalkyl group, wherein each alkyl group of the trialkyl silane group has 1 to 6 carbons, and each alkyl group of the oxoalkyl group has 4 to 20 carbons:
• in the Formula (V), the X4 represent a hydrogen atom or an alkyl group of 1 to 10 carbons, and the alkyl group represents a linear alkyl group, a branched alkyl group or a cycloalkyl group;
• the X5 and the X6 respectively represent a hydrogen atom, a linear alkyl group of 1 to 10 carbons, a branched group of 4 to 10 carbons or a cycloalkyl group of 3 to 10 carbons;
• and when the X5 and the X6 represent the linear alkyl group or the branched alkyl group, the X5 and the X6 are boned to form a ring structure;
• an ortho-naphthoquinone diazide sulfonic acid ester (C);
• and
• a solvent (D).