Photomask blank
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsKouhei Sasamoto, Yukio Inazuki, Souichi Fukaya, Hideo Nakagawa, Hideo Kaneko
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Abstract
A photomask blank comprising a transparent substrate and a chromium-containing film deposited thereon is provided. The chromium-containing film comprises at least one CrC compound layer comprising up to 50 at % of Cr, at least 25 at % of O and/or N, and at least 5 at % of C. From the blank, a photomask having a photomask pattern formed on the substrate is produced, the photomask being used in photolithography of forming a resist pattern with a line width of up to 0.1 μm, using exposure light having a wavelength of up to 250 nm.
Claims24
A photomask blank from which is produced a photomask comprising a transparent substrate and a photomask pattern formed thereon, the photomask being used in photolithography of forming a resist pattern of lines with a width of up to 0.1 μm, using exposure light having a wavelength of up to 250 nm,
- said photomask blank comprising the transparent substrate and a chromium-containing film deposited on the substrate directly or via at least one additional film, said chromium-containing film comprising one or more layers, at least one of the layer being a CrC compound layer comprising up to 50 at % of chromium, at least 25 at % in total of oxygen and/or nitrogen, and at least 5 at % of carbon, wherein the CrC compound layer has a sheet resistance of at least 5,000 ohm per square.
A photomask blank from which is produced a photomask comprising a transparent substrate and a photomask pattern formed thereon, the photomask being used in photolithography of forming a resist pattern of lines with a width of up to 0.1 μm, using exposure light having a wavelength of up to 250 nm,
- said photomask blank comprising the transparent substrate and a chromium-containing film deposited on the substrate directly or via at least one additional film, said chromium-containing film comprising one or more layers, at least one of the layer being a CrC compound layer comprising up to 50 at % of chromium, at least 25 at % in total of oxygen and/or nitrogen, and at least 16 at % of carbon.
Dependencies are inferred from the claim text.