Method for producing a reflective optical component for an EUV projection exposure apparatus and component of this type
AssigneeCarl Zeiss SMT GmbH
InventorsHolger Kierey, Heiko Siekmann, Andre Bresan
Life of this patent
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Abstract
A method for producing a reflective optical component for an EUV projection exposure apparatus, the component having a substrate having a base body, and a reflective layer arranged on the substrate, wherein the substrate has an optically operative microstructuring, comprises the following steps: working the microstructuring into the substrate, polishing the substrate after the microstructuring has been worked into the substrate, applying the reflective layer to the substrate. A reflective optical component for an EUV projection exposure apparatus correspondingly has a polished surface between the microstructuring and the reflective layer.
Claims16
A method, comprising:
- working an optically operative microstructuring into an initial substrate to provide a microstructured substrate;
- applying a polishing layer to the microstructured substrate;
- polishing the polishing layer to provide a polished, polishing layer having a surface with a roughness of less than 0.2 nanometer rms;
- and
- applying a reflective layer to the polished, polishing layer,
- wherein:
- the reflective layer has a surface roughness of less than 0.2 nanometer rms;
- and
- the reflective layer is configured to reflect EUV radiation.
A component, comprising:
- a substrate comprising an optically operative microstructuring;
- a polishing layer supported by the optically operative microstructuring, the polishing layer having a surface with a roughness of less than 0.2 nanometer rms;
- and
- a reflective layer supported by the surface of the polishing layer,
- wherein a surface of the reflective layer has a roughness of less than 0.2 nanometer rms, and the reflective layer is configured to reflect EUV radiation.
Dependencies are inferred from the claim text.