Method for calibrating a manufacturing process model
AssigneesASML Netherlands B.V., National Taiwan University
InventorsKuen-Yu Tsai, Alek Chi-Heng Chen, Jia-Han Li
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AssigneesASML Netherlands B.V., National Taiwan University
InventorsKuen-Yu Tsai, Alek Chi-Heng Chen, Jia-Han Li
Estimating the term…
Calibration of models for manufacturing processes that are subject to circuit layout proximity effects is performed, including optical proximity correction (OPC) model calibration. A target structure is produced using a layout and a manufacturing process. The target structure is illuminated and an electromagnetic scattering property is detected. A manufacturing process model for simulation of the manufacturing process is produced, which comprises at least one manufacturing process parameter determining a model electromagnetic scattering property using the manufacturing process model and the layout. The model electromagnetic scattering property is compared to the detected electromagnetic scattering property and based on the result of the comparison, calibrated manufacturing process parameters are output for calibrating the manufacturing process model. The determining and the layout may include determining structural information corresponding to the target structure using the manufacturing process model and determining the model electromagnetic scattering property using the structural information.
A method of calibrating a manufacturing process model comprising:
A computer program product containing one or more sequences of machine-readable instructions for calibrating a manufacturing process model, the instructions being adapted to cause one or more processors to perform an operation comprising:
A method of calibrating a structure model comprising:
Dependencies are inferred from the claim text.