Sputtering target for magnetic recording film
AssigneeJX Nippon Mining & Metals Corporation
InventorShini-ichi Ogino
Life of this patent
Estimating the term…
Loading patent…
AssigneeJX Nippon Mining & Metals Corporation
InventorShini-ichi Ogino
Estimating the term…
Provided is a sputtering target for a magnetic recording film. The sputtering target has a peak intensity ratio (IG/ID) of a G-band to a D-band of 5.0 or more in Raman scattering spectrometry. It is an object of the present invention to produce a magnetic thin film having a granular structure without using a high cost co-sputtering apparatus and to provide a sputtering target, in particular, an Fe—Pt-based sputtering target for a magnetic recording film, where carbon particles are dispersed in the target. Since carbon is a material which is not susceptible to being sintered and is susceptible to form aggregates, a conventional carbon-containing sputtering target has the problem that detachment of carbon lumps occurs during sputtering to result in generation of a large number of particles on the film. The present invention also addresses the problem of providing a high density sputtering target that can overcome the disadvantages.
A sputtering target having a sintered body for a magnetic recording film comprising:
A sputtering target for producing a magnetic recording film, comprising a sintered body comprising a metal matrix and carbon particles in a form of flaked graphite dispersed in said metal matrix and having a peak intensity ratio (IG/ID) for a peak intensity of the G-band, IG, and a peak intensity of the D-band, ID, of 5.0 or more in Raman scattering spectrometry, said metal matrix consisting of Fe and 5 mol % or more and 60 mol % or less of Pt, and a content of said carbon particles in said sintered body being 10 mol % or more and 70 mol %, wherein the sputtering target further comprises 0.5 mol % or more and 20 mol % or less of particles of at least one oxide additive selected from the group consisting of SiO2 ,Cr2O3, CoO, Ta2O5, B2O3,MgO, and Co3O4.
A sputtering target for producing a magnetic recording film, comprising a sintered body comprising a metal matrix and carbon particles in a form of flaked graphite dispersed in said metal matrix and having a peak intensity ratio (IG/ID) for a peak intensity of the G-band, IG, and a peak intensity of the D-band, ID, of 5.0 or more in Raman scattering spectrometry, said metal matrix consisting of Fe, 5 mol % or more and 60 mol % or less of Pt, and 0.5 mol % or more and 20 mol % or less of at least one additional element selected from the group consisting of B, Ru, Au, and Cu, and a content of said carbon particles in said sintered body being 10 mol % or more and 70 mol %, wherein the sputtering target further comprises 0.5 mol % or more and 20 mol % or less of particles of at least one oxide additive selected from the group consisting of SiO2 ,Cr2O3, CoO, Ta2O5, B2O3,MgO, and Co3O4.
Dependencies are inferred from the claim text.