Gas barrier film and method for manufacturing gas barrier film

A gas barrier film comprising a gas barrier layer on at least one surface of a substrate, the gas barrier layer containing silicon, oxygen, and carbon, wherein

• distribution curves of silicon, oxygen, and carbon obtained through element distribution measurement for the gas barrier layer in a depth direction using X-ray photoelectron spectroscopy satisfy all of following conditions (i) to (iv):
• (i) atomic percentages of silicon, oxygen, and carbon have a following relationship in an area covering 90% or more of a distance from a surface of the gas barrier layer across a thickness;
• (atomic percentage of carbon)<(atomic percentage of silicon)<(atomic percentage of oxygen);
• (ii) the carbon distribution curve has at least two local extremum points;
• (iii) an absolute value of a difference between a maximum value and a minimum value of the atomic percentage of carbon on the carbon distribution curve is 5 at % or more;
• and
• (iv) on the oxygen distribution curve, a value of a local maximum point of the oxygen distribution curve closest to the surface, adjacent to the substrate, of the gas barrier layer is largest of values of local maximum points of the oxygen distribution curve of the gas barrier layer;
• and
• wherein the atomic percentage of oxygen at the local maximum point of the oxygen distribution curve closest to the surface, adjacent to the substrate, of the gas barrier layer is 1.05 times or more the atomic percentage of oxygen at a local maximum point of the oxygen distribution curve closest to the surface, remote from the substrate, of the gas barrier layer.