Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom

A compound represented by formula (1) or formula (2):

• wherein R1 are each independently a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms wherein the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a heteroatom, or an aromatic group having 6 to 30 carbon atoms;
• R2 are each independently a hydrogen atom, a halogen atom, a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group and may be the same or different on the same naphthalene ring;
• at least two of R2 on at least one of the naphthalene moieties is a hydroxyl group in the formula (1);
• at least one of R2 is a hydroxyl group in the formula (2);
• n is an integer of 2 to 4;
• the structural formulas of the repeating units in the formulas (1) and (2) may be the same or different;
• in the formula (1), m1 are each independently an integer of 1 to 7;
• and
• in the formula (2), X are each independently an oxygen atom or a sulfur atom, and m2 are each independently an integer of 1 to 6.