US 9,540,301 B2 · Method for manufacturing phosphonocrotonic acid derivative

Abstract

Provided is a method of manufacturing a high quality phosphonocrotonic acid derivative. The present invention is a method of manufacturing a compound represented by the following Formula (3) by reacting a compound represented by the following Formula (1) with a compound represented by the following Formula (2), which comprises a treatment process using an acid or base. [in the formula, R1 represents a C1-6 linear or branched alkyl group that may be substituted by a C6-10 aryl group, a C2-6 linear or branched alkenyl group that may be substituted by a C6-10 aryl group, a C2-6 linear or branched alkynyl group that may be substituted by a C6-10 aryl group, or a C6-10 aryl group, R2 represents a hydrogen atom, or a C1-6 linear or branched alkyl group that may be substituted by a C6-10 aryl group, R3 represents a C1-6 linear or branched alkyl group, a C6-10 aryl group, or a halogen atom, and X represents a halogen atom, and multiple R1s may be the same or different].

Claims37

Dependent claims

A method for manufacturing a compound of Formula (III), the method comprising:

reacting a compound of Formula (I) with a compound of Formula (II) to obtain a reaction product;
and
contacting the reaction product with (i) at least one acid selected from the group consisting of hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, nitrous acid, trifluoroacetic acid, oxalic acid, formic acid, acetylacetic acid, lactic acid, succinic acid, benzoic acid, adipic acid, acetic acid, and propionic acid, or (ii) a base, thereby obtaining the compound of Formula (III),
wherein
each R1 is independently a C1-6 linear or branched alkyl group that optionally is substituted by a C6-10 aryl group, a C2-6 linear or branched alkenyl group that optionally is substituted by a C6-10 aryl group, a C2-6 linear or branched alkynyl group that optionally is substituted by a C6-10 aryl group, or a C6-10 aryl group, R2 is a hydrogen atom, or a C1-6 linear or branched alkyl group that optionally is substituted by a C6-10 aryl group,
R3 is a C1-6 linear or branched alkyl group, a C6-10 aryl group, or a halogen atom, and
X is a halogen atom.

4 more elements

A method for manufacturing a compound comprising a 3-methylpenta-2,4-dienoic acid residue, the method comprising:

reacting a compound of Formula (I) with a compound of Formula (II) to obtain a reaction product;
contacting the reaction product with (i) at least one acid selected from the group consisting of hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, nitrous acid, trifluoroacetic acid, oxalic acid, formic acid, acetylacetic acid, lactic acid, succinic acid, benzoic acid, adipic acid, acetic acid, and propionic acid, or (ii) a base, to obtain a compound of Formula (III);
and
subsequently reacting the compound of Formula (III) with a carbonyl compound,
wherein
each R1 is independently a C1-6 linear or branched alkyl group that optionally is substituted by a C6-10 aryl group, a C2-6 linear or branched alkenyl group that optionally is substituted by a C6-10 aryl group, a C2-6 linear or branched alkynyl group that optionally is substituted by a C6-10 aryl group, or a C6-10 aryl group,
X is a halogen atom,
R2 is a hydrogen atom, or a C1-6 linear or branched alkyl group that optionally is substituted by a C6-10 aryl group, and
R3 is a C1-6 linear or branched alkyl group, a C6-10 aryl group, or a halogen atom.

6 more elements

Dependencies are inferred from the claim text.

Method for manufacturing phosphonocrotonic acid derivative

Life of this patent

Method for manufacturing phosphonocrotonic acid derivative

Life of this patent

Abstract

Claims37