Process for drying HCFO-1233zd
AssigneeHoneywell International Inc.
InventorsYuon Chiu, Stephen A. Cottrell
Life of this patent
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Abstract
Disclosed is a process to dry 1-chloro-3,3,3-trifluoropropene (HCFO-1233zd) or its mixtures by washing with water and or alkaline solution. The resulting liquid mixture, containing HCFO-1233zd, other organic, and water, is allowed to settle, and thereafter, the lighter water layer is decanted off from the top of the mixture. The heavier HCFO-1233zd layer is then withdrawn from the bottom of the decanter to a desiccant dryer (e.g., molecular sieve, activated alumina, silica gel, and the like) to further remove the residual soluble moisture from the HCFO-1233zd to about 80 ppm or less.
Claims11
In the process of purifying crude 1-chloro-3,3,3-trifluoropropene (HCFO-1233zd), wherein the crude HCFO-1233zd product requires aqueous washing to remove HF, HC1, and other acidic components,
- the improvement comprising conducting each of the following steps in order:
- (a) washing the crude HCFO-1233zd with water to form a washed mixture;
- (b) condensing the washed mixture;
- and
- (c) separating the washed mixture into a lighter water layer and heavier HCFO-1233zd layer, followed by drying the HCFO-1233zd layer with a desiccant, thereby producing an HCFO-1233zd product with a moisture level of 80 ppm or less.
Dependencies are inferred from the claim text.