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US 9,540,252 B1Granted
Ultraviolet disinfection system
AssigneeRayVio Corporation
InventorsDouglas A. Collins, Yitao Liao, Robert S. West
Life of this patent
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Abstract
Embodiments of the invention include an elongate chamber. A UV source includes a semiconductor device, the semiconductor device including an active layer disposed between an n-type region and a p-type region. The active layer emits radiation having a peak wavelength in a UV range. The semiconductor device is positioned on a wall of the elongate chamber. An inner surface of the elongate chamber is reflective.
Claims15
A structure comprising:
- an elongate chamber;
- and
- a ultraviolet (UV) source comprising a semiconductor device comprising an active layer disposed between an n-type region and a p-type region, wherein the active layer emits radiation having a peak wavelength in a UV range;
- wherein
- the semiconductor device is positioned on a wall of the elongate chamber;
- the semiconductor device is positioned in a water tight compartment formed by a sealing material disposed adjacent the semiconductor device, such that a growth substrate of the semiconductor device is in contact with a fluid disposed in the elongate chamber;
- and
- an inner surface of the elongate chamber causes reflection.
5 more elements
Dependencies are inferred from the claim text.