Mechanical method for producing micro- or nano-scale textures

A method for producing textures on a substrate comprising a surface material layer, the method comprising:

• pressing a scratcher against the substrate, the scratcher including a base structure and a plurality of micron-level features protruding away from the base structure, wherein pressing the scratcher comprises biasing the scratcher against the substrate such that at least some of the plurality of micron-level features pierce an outer surface of the surface material layer;
• and
• moving the scratcher relative to the substrate such that at least some of the plurality of micron-level features displace portions of said surface material layer in a manner that produces parallel elongated grooves defined in the surface material layer and separated by parallel elongated ridges formed by remaining portions of the surface material layer,
• wherein the substrate comprises a flexible sheet portion extending between a first rolled portion and second rolled portion, and
• wherein moving the scratcher relative to the substrate comprises feeding the flexible sheet portion from the first rolled portion to the second rolled portion such that the flexible sheet portion passes under the scratcher.

A method for producing textures on a substrate comprising a surface material layer, the method comprising:

• pressing a scratcher against the substrate, the scratcher including a base structure and a plurality of micron-level features protruding away from the base structure, wherein pressing the scratcher comprises biasing the scratcher against the substrate such that at least some of the plurality of micron-level features pierce an outer surface of the surface material layer;
• and
• moving the scratcher relative to the substrate such that at least some of the plurality of micron-level features displace portions of said surface material layer in a manner that produces parallel elongated grooves defined in the surface material layer and separated by parallel elongated ridges formed by remaining portions of the surface material layer,
• wherein the base structure of the scratcher comprises a single-piece crystal substrate,
• wherein the plurality of micron-level features comprise a plurality of exposed vertices of the single-piece crystal disposed on a frontside surface of the single-piece crystal substrate, and
• wherein pressing the scratcher comprises pressing a backside surface of the single-piece crystal substrate such that the micron-level features are pressed toward the substrate.

A method for producing textures on a substrate comprising a surface material layer, the method comprising:

• pressing a scratcher against the substrate, the scratcher including a base structure and a plurality of micron-level features protruding away from the base structure, wherein pressing the scratcher comprises biasing the scratcher against the substrate such that at least some of the plurality of micron-level features pierce an outer surface of the surface material layer;
• and
• moving the scratcher relative to the substrate such that at least some of the plurality of micron-level features displace portions of said surface material layer in a manner that produces parallel elongated grooves defined in the surface material layer and separated by parallel elongated ridges formed by remaining portions of the surface material layer,
• wherein the plurality of micron-level features are arranged in a plurality of offset rows on the base structure, and
• wherein positioning the scratcher over the substrate comprises aligning the plurality of rows of said micron-level features in one of a cross direction that is substantially perpendicular to a moving direction of said relative movement between said scratcher and said substrate, and a diagonal direction that is diagonal to said one of the cross-process direction and the process direction.

A method for producing textures on a substrate comprising a surface material layer, the method comprising:

• pressing a scratcher against the substrate, the scratcher including a base structure and a plurality of micron-level features protruding away from the base structure, wherein pressing the scratcher comprises biasing the scratcher against the substrate such that at least some of the plurality of micron-level features pierce an outer surface of the surface material layer;
• and
• moving the scratcher relative to the substrate such that at least some of the plurality of micron-level features displace portions of said surface material layer in a manner that produces parallel elongated grooves defined in the surface material layer and separated by parallel elongated ridges formed by remaining portions of the surface material layer,
• further comprising removing debris from said substrate utilizing one of:
• a) applying and removing an adhesive film after said moving;
• b) performing an etching process after said moving;
• c) performing ultrasonic agitation after said moving;
• d) rubbing said substrate with one of a soft material and a fine polishing pad;
• e) heat treating said substrate after said moving;
• f) directing a high pressure fluid jet onto said substrate after said moving;
• g) flattening said debris onto said substrate using one of a knife and a roller;
• and
• h) providing said scratcher with a debris removal device that removes said debris during said moving.

A method for producing textures on a substrate comprising a surface material layer, the method comprising:

• pressing a scratcher against the substrate, the scratcher including a base structure and a plurality of micron-level features protruding away from the base structure, wherein pressing the scratcher comprises biasing the scratcher against the substrate such that at least some of the plurality of micron-level features pierce an outer surface of the surface material layer;
• and
• moving the scratcher relative to the substrate such that at least some of the plurality of micron-level features displace portions of said surface material layer in a manner that produces parallel elongated grooves defined in the surface material layer and separated by parallel elongated ridges formed by remaining portions of the surface material layer,
• further comprising, prior to said moving, performing one of:
• a) utilizing a heater to soften said surface material layer;
• and
• b) applying a protective layer over the surface material layer.